摘要:
Provided are a liquid crystal polymer particle in which a difference in contact angle of the liquid crystal polymer particle with water due to a water droplet in air at 25° C. and 50% RH between inside the particle and a surface of the particle is 7° or greater, a liquid crystal polymer particle in which a difference in atomic ratio of an oxygen atom to a carbon atom measured by X-ray photoelectron spectroscopy between inside a particle and a surface of the particle is 0.02 or greater, a method of producing the liquid crystal polymer particle, and a composite material formed of the liquid crystal polymer particle.
摘要:
An under layer film having excellent surface planarity is provided. In one aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A) containing an ethylenic unsaturated group (P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin (A) having an acid value of smaller than 1.0 mmol/g. In another aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B).
摘要:
Provided are a coating composition including nonionic polymer particles having a number-average primary particle diameter of 5 nm to 200 nm and a hydrolysable silane compound represented by Formula 1, an antireflection film which is a cured substance of the coating composition, a laminate including the antireflection film, a method for manufacturing the laminate, and a solar cell module including the laminate.In Formula 1, X represents a hydrolysable group or a halogen atom, Y represents a non-hydrolysable group, and n represents an integer of 0 to 2. (YnSiX)4-n Formula 1
摘要:
Provided are a photocurable composition capable of suppressing both deformation (change in line width roughness (ΔLWR)) of a pattern after etching and breakage of a pattern after etching, a pattern forming method, and a method for manufacturing a device. Disclosed is a photocurable composition including a monofunctional (meth)acrylate represented by the following General Formula (I) and a photopolymerization initiator, where R1 represents a hydrogen atom or a methyl group; R2 represents an alkyl group which may be substituted with a fluorine atom, R3 represents a hydrogen atom, a linear alkyl group which may be substituted with a fluorine atom, or a branched alkyl group which may be substituted with a fluorine atom, R4 to R8 each independently represent a hydrogen atom, a halogen atom, a linear alkyl group having 1 to 4 carbon atoms, or a branched alkyl group having 3 or 4 carbon atoms, the total number of carbon atoms included in R2 and R3 is 1 to 6, and R2 and R3, or R2 and R4 may be bonded to each other and form a ring.
摘要:
Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device.Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.
摘要:
A curable composition for optical imprinting which is excellent in ink jet adequacy and releasability, a pattern forming method, a fine pattern, and a method for manufacturing a semiconductor device are provided. The curable composition for optical imprinting contains a polymerizable compound (A), a photopolymerization initiator (B), and a compound (C) expressed by General Formula (I); in General Formula (I), A represents a dihydric to hexahydric polyhydric alcohol residue. p represents 0 to 2, q represents 1 to 6, p+q represents an integer of 2 to 6, each of m and n independently represents 0 to 20. r expressed by Formula (1) is 6 to 20. Each R independently represents an alkyl group having 1 to 10 carbon atoms, an aryl group, or an acyl group.
摘要:
To obtain a good pattern having a good profile of etched pattern. A method for manufacturing an adhesive film for imprints, the method comprising applying an adhesive composition for imprints in a base, and then rinsing the adhesive composition for imprints.
摘要:
Provided are a polymer film including a particle-containing layer that contains at least one resin selected from the group consisting of a liquid crystal polymer, a polysulfone resin, a polyethersulfone resin, and a polyphenylene sulfide resin, and liquid crystal polymer particles, in which a content of the liquid crystal polymer particles in the particle-containing layer is 40% by volume or greater, and a method of producing the same, and a laminate formed of the polymer film and a method of producing the same.
摘要:
Provided is a composition capable of producing an underlying film which demonstrates a good adhesiveness between a substrate and a layer to be imprinted, showing a good in-plane uniformity of the thickness, and a small defect density. The composition includes a polymerizable compound, a first solvent, and a second solvent, the first solvent having a boiling point at 1 atm of 160° C. or higher, the second solvent having a boiling point at 1 atm of lower than 160° C., and the content of the polymerizable compound in the composition being less than 1% by mass.
摘要:
Provided is an adhesion-promoting composition between a curable composition for imprints and a substrate, which excellent in adhesiveness and can control pattern failure. An adhesion-promoting composition used between a curable composition for imprints and a substrate, which comprises a compound having a molecular weight of 500 or larger and having a reactive group, and has a content of a compound, with a molecular weight of 200 or smaller, of more than 1% by mass and not more than 10% by mass of a total solid content.