Invention Application
US20160021707A1 LOCAL TEMPERATURE CONTROL OF SUSCEPTOR HEATER FOR INCREASE OF TEMPERATURE UNIFORMITY
有权
用于提高温度均匀性的SUSCEPTOR加热器的局部温度控制
- Patent Title: LOCAL TEMPERATURE CONTROL OF SUSCEPTOR HEATER FOR INCREASE OF TEMPERATURE UNIFORMITY
- Patent Title (中): 用于提高温度均匀性的SUSCEPTOR加热器的局部温度控制
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Application No.: US14335278Application Date: 2014-07-18
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Publication No.: US20160021707A1Publication Date: 2016-01-21
- Inventor: Sokol Ibrani
- Applicant: ASM IP HOLDING B.V.
- Assignee: ASM IP HOLDING B.V.
- Current Assignee: ASM IP HOLDING B.V.
- Main IPC: H05B6/10
- IPC: H05B6/10 ; C23C16/46 ; C23C16/458
Abstract:
A heating assembly, such as may be used in thin film deposition, and a method of use is provided for improved temperature uniformity of a susceptor and substrate heated by the heating assembly. The substrate may be a semi-conductor wafer.
Public/Granted literature
- US10009961B2 Local temperature control of susceptor heater for increase of temperature uniformity Public/Granted day:2018-06-26
Information query
