发明申请
- 专利标题: Meander Line Resistor Structure
- 专利标题(中): 曲折线电阻器结构
-
申请号: US14880965申请日: 2015-10-12
-
公开(公告)号: US20160035729A1公开(公告)日: 2016-02-04
- 发明人: Hsiao-Tsung Yen , Yu-Ling Lin
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 主分类号: H01L27/108
- IPC分类号: H01L27/108 ; H01L23/522 ; H01L23/528 ; H01L27/06 ; H01L29/06
摘要:
A system comprises a first transistor comprising a first drain/source region and a second drain/source region, a second transistor comprising a third drain/source region and a fourth drain/source region, wherein the first transistor and the second transistor are separated by an isolation region, a first resistor formed by at least two vias, wherein a bottom via of the first resistor is in direct contact with the first drain/source region, a second resistor formed by at least two vias, wherein a bottom via of the second resistor is in direct contact with the second drain/source region, a bit line connected to the third drain/source region through a plurality of bit line contacts and a capacitor connected to the fourth drain/source region through a capacitor contact.
公开/授权文献
- US09461048B2 Meander line resistor structure 公开/授权日:2016-10-04
信息查询
IPC分类: