Invention Application
US20160048015A1 DISPLAYS HAVING REDUCED OPTICAL SENSITIVITY TO APERTURE ALIGNMENT AT STEPPER FIELD BOUNDARY 审中-公开
具有降低光学对准性能的显示屏在STEPPER现场边界

DISPLAYS HAVING REDUCED OPTICAL SENSITIVITY TO APERTURE ALIGNMENT AT STEPPER FIELD BOUNDARY
Abstract:
Systems, methods and methods of manufacture for, among other things, a MEMS display that has a substrate with a first and a second array of apertures. The first and second arrays are, typically, formed on the substrate so that the arrays are adjacent and define a field boundary line that may extend between the two arrays and along a width of the substrate. In at least one array, the apertures that are proximate the field boundary line are placed at locations on the substrate to reduce differences in luminance between one portion of the display and another portion of the display.
Public/Granted literature
Information query
Patent Agency Ranking
0/0