Invention Application
US20160054658A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
审中-公开
图案形成方法，制造电子装置的方法和电子装置
- Patent Title: PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
- Patent Title (中): 图案形成方法，制造电子装置的方法和电子装置
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Application No.: US14918949Application Date: 2015-10-21
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Publication No.: US20160054658A1Publication Date: 2016-02-25
- Inventor: Masahiro YOSHIDOME , Tsukasa YAMANAKA
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2013-097167 20130502
- Main IPC: G03F7/32
- IPC: G03F7/32 ; G03F7/20
Abstract:
Provided is a pattern forming method including a step of applying a solvent (S) onto a substrate, a step of applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate, on which the solvent (S) has been applied, to form an actinic ray-sensitive or radiation-sensitive film, a step of exposing the actinic ray-sensitive or radiation-sensitive film, and a step of developing the exposed actinic ray-sensitive or radiation-sensitive film with a developing liquid containing an organic solvent to form a negative-type pattern.
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