PATTERN FORMING METHOD, AND, METHOD FOR PRODUCING ELECTRONIC DEVICE AND ELECTRONIC DEVICE, EACH USING THE SAME
    4.
    发明申请
    PATTERN FORMING METHOD, AND, METHOD FOR PRODUCING ELECTRONIC DEVICE AND ELECTRONIC DEVICE, EACH USING THE SAME 审中-公开
    图案形成方法,以及使用其制造电子设备和电子设备的方法

    公开(公告)号:US20150160555A1

    公开(公告)日:2015-06-11

    申请号:US14606189

    申请日:2015-01-27

    Abstract: The pattern forming method of the invention includes (i) a step of forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition including a resin (A) capable of increasing the polarity by the action of an acid to decrease the solubility in a developer including an organic solvent; (ii) a step of exposing the first film; (iii) a step of developing the exposed first film using a developer including an organic solvent to form a negative tone pattern; and (iv) a step of forming a second film on the second substrate so as to cover the periphery of the negative tone pattern.

    Abstract translation: 本发明的图案形成方法包括:(i)使用光化射线敏感性或辐射敏感性树脂组合物在基材上形成第一膜的步骤,所述光敏感或辐射敏感性树脂组合物包含能够通过酸的作用而提高极性的树脂(A) 以降低在包含有机溶剂的显影剂中的溶解度; (ii)暴露第一膜的步骤; (iii)使用包含有机溶剂的显影剂显影所述曝光的第一膜以形成负色调图案的步骤; 以及(iv)在第二基板上形成第二膜以覆盖负色调图案的周边的步骤。

    PATTERN FORMATION METHOD, ETCHING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE
    6.
    发明申请
    PATTERN FORMATION METHOD, ETCHING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE 有权
    图案形成方法,蚀刻方法,电子装置制造方法和电子装置

    公开(公告)号:US20160342083A1

    公开(公告)日:2016-11-24

    申请号:US15229247

    申请日:2016-08-05

    Abstract: A pattern formation method includes step (i) of forming a first negative type pattern on a substrate by performing step (i-1) of forming a first film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition, step (i-2) of exposing the first film and step (i-3) of developing the exposed first film in this order; step (iii) of forming a second film at least on the first negative type pattern using an actinic ray-sensitive or radiation-sensitive resin composition (2); step (v) of exposing the second film; and step (vi) of developing the exposed second film and forming a second negative type pattern at least on the first negative type pattern.

    Abstract translation: 图案形成方法包括通过使用光化射线敏感性或辐射敏感性树脂组合物在基板上形成第一膜的步骤(i-1)来在基板上形成第一负型图案的步骤(i),步骤 i-2),使第一膜和第(i-3)步曝光; 使用光化射线敏感或辐射敏感性树脂组合物(2)至少在第一负型图案上形成第二膜的步骤(iii)。 步骤(v)使第二膜曝光; 以及步骤(vi),使至少在第一负型图案上显影出曝光的第二膜并形成第二负型图案。

    PATTERN FORMATION METHOD, ELECTRONIC-DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE
    7.
    发明申请
    PATTERN FORMATION METHOD, ELECTRONIC-DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE 审中-公开
    图案形成方法,电子装置制造方法和电子装置

    公开(公告)号:US20160033870A1

    公开(公告)日:2016-02-04

    申请号:US14884345

    申请日:2015-10-15

    Abstract: A pattern formation method which includes a process of forming an actinic ray sensitive or radiation sensitive film by coating a substrate with an actinic ray sensitive or radiation sensitive resin composition which contains a resin where the degree of solubility with respect to a developer which includes one or more types of organic solvents decreases due to an effect of an acid, a compound which generates an acid by irradiation with actinic rays or radiation, and a solvent, a process of exposing the actinic ray sensitive or radiation sensitive film via an immersion liquid, a process of heating the actinic ray sensitive or radiation sensitive film, and a process of developing the actinic ray sensitive or radiation sensitive film using the developer which includes an organic solvent in this order, in which a process of cleaning the actinic ray sensitive or radiation sensitive film is included after the film forming process and before the exposing process and/or after the exposing process and before the heating process.

    Abstract translation: 一种图形形成方法,其包括通过用包含树脂的光化射线敏感或辐射敏感性树脂组合物涂布基材来形成光化射线敏感或辐射敏感膜的方法,其中相对于显影剂的溶解度包括一种或 更多类型的有机溶剂由于酸,通过用光化射线或辐射照射而产生酸的化合物和溶剂的作用而降低,溶剂,通过浸渍液曝露光化学敏感或辐射敏感膜的方法, 加热光化射线敏感或辐射敏感膜的方法,以及使用包括有机溶剂的显影剂依次显影光化射线敏感或辐射敏感膜的过程,其中清洁光化学射线敏感或辐射敏感膜的过程 在成膜过程之后和曝光过程之前和/或曝光过程之后包括胶片 ss和加热过程之前。

    PATTERN PEELING METHOD, ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING THE SAME
    10.
    发明申请
    PATTERN PEELING METHOD, ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING THE SAME 审中-公开
    图案剥离方法,电子装置及其制造方法

    公开(公告)号:US20160077440A1

    公开(公告)日:2016-03-17

    申请号:US14946206

    申请日:2015-11-19

    Abstract: The present invention has an object to provide a pattern peeling method which is excellent in peelability and causes less damage to a substrate, a method for manufacturing an electronic device, including the pattern peeling method, and an electronic device manufactured by the method for manufacturing an electronic device. The present invention includes a resist film forming step of applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film; an exposing step of exposing the resist film; a developing step of developing the exposed resist film using a developing liquid containing an organic solvent to form a negative-type pattern; and a peeling step of peeling the negative-type pattern using the following liquid A or B: A: a liquid containing a sulfoxide compound and/or an amide compound; or B: a liquid containing sulfuric acid and hydrogen peroxide.

    Abstract translation: 本发明的目的是提供一种图案剥离方法,该剥离方法具有优异的剥离性和对基材的损害较小,包括图案剥离方法的电子装置的制造方法,以及通过该方法制造的电子装置 电子设备。 本发明包括在基板上涂布光化射线敏感性或辐射敏感性树脂组合物以形成抗蚀剂膜的抗蚀剂膜形成步骤; 暴露所述抗蚀剂膜的曝光步骤; 使用含有有机溶剂的显影液显影曝光的抗蚀剂膜以形成负型图案的显影步骤; 以及使用以下液体A或B剥离负型图案的剥离步骤:A:含有亚砜化合物和/或酰胺化合物的液体; 或B:含硫酸和过氧化氢的液体。

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