Invention Application
- Patent Title: SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD
- Patent Title (中): 源收集器装置,光刻装置和方法
-
Application No.: US14781262Application Date: 2014-03-05
-
Publication No.: US20160054663A1Publication Date: 2016-02-25
- Inventor: Niek Antonius Jacobus Maria KLEEMANS , Denis Alexandrovich GLUSHKOV , Ronald Johannes HULTERMANS , Benedictus Mathijs RENKENS , Gerardus Hubertus Petrus Maria SWINKELS , Christiaan Johannes Petrus VERSPEEK
- Applicant: ASML NETHERLANDS B.V.
- International Application: PCT/EP2014/054221 WO 20140305
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H05G2/00

Abstract:
A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.
Public/Granted literature
- US09841680B2 Source collector apparatus, lithographic apparatus and method Public/Granted day:2017-12-12
Information query
IPC分类: