According to embodiments of the present invention, an aberration correction apparatus is provided. The aberration correction apparatus includes an aberration correction unit including a first conductive element, and a second conductive element arranged rotationally symmetrical about the first conductive element, wherein the aberration correction unit is arranged to propagate an annular beam having charged particles in between the first conductive element and the second conductive element such that propagation of the annular beam through the aberration correction unit is rotationally symmetrical about the first conductive element, and wherein the aberration correction unit is configured to generate, between the first conductive element and the second conductive element, a magnetic field force and an electric field force directed in opposite directions and superimposed on each other to act on the charged particles to change a trajectory of the charged particles, and an annular aperture optically coupled to the aberration correction unit.