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公开(公告)号：US12125671B2
公开(公告)日：2024-10-22
申请号：US17778036
申请日：2020-11-19
发明人： Stijn Wilem Herman Karel Steenbrink , Marco Jan-Jaco Wieland , Albertus Victor Gerardus Mangnus
IPC分类号： H01J37/317 , H01J37/141 , H01J37/147 , H01J37/28
CPC分类号： H01J37/3177 , H01J37/141 , H01J37/1474 , H01J37/28 , H01J2237/0453 , H01J2237/2817
摘要： A multi-source illumination apparatus for illuminating a sample with charged particles, wherein beams, from a plurality of sources, are arranged such that a beam from at least one source intersects, at a plane of a condenser lens, with at least part of one other beam from a different one of the plurality of sources. The condenser lens is configured to separately collimate the received beams from each source. A manipulator array arrangement is configured to manipulate the collimated beams to generate one or more beams, in a single column, that include charged particles from the plurality of sources. The manipulator array arrangement includes a multi-beam generator configured to receive the plurality of substantially parallel substantially collimated beams generated by the deflector array, and generate a multibeam in dependence on the received plurality of substantially parallel substantially collimated beams, wherein the multi-beam includes a plurality of substantially collimated sub-beams.
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公开(公告)号：US11908658B2
公开(公告)日：2024-02-20
申请号：US17645859
申请日：2021-12-23
发明人： Qinglang Meng , Weiqiang Sun
IPC分类号： H01J37/28 , H01J37/09 , H01J37/141 , H01J37/147 , H01J37/244
CPC分类号： H01J37/28 , H01J37/09 , H01J37/141 , H01J37/147 , H01J37/244
摘要： A scanning electron microscope device for a sample to be detected and an electron beam inspection apparatus are provided, the scanning electron microscope device being configured to project electron beam to a surface of the sample to generate backscattered electrons and secondary electrons, and comprising: an electron beam source, a deflection mechanism, and an objective lens assembly. The deflection mechanism comprises a first deflector located downstream the electron beam source and a second deflector located downstream the first deflector. The objective lens assembly comprises: an excitation coil; and a magnetic yoke, formed by a magnetizer material as a housing which opens towards the sample and comprising a hollow body defining an internal chamber where the excitation coil is accommodated, and at least one inclined portion extending inward from the hollow body at an angle with reference to the hollow body and directing towards the optical axis, with an end of the at least one inclined portion being formed into a pole piece. The deflection mechanism further comprises a third deflector located between the second deflector and the objective lens assembly and disposed in an opening delimited and circumscribed by the pole piece, and each of the first deflector, the second deflector and the third deflector is an electrostatic deflector.
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公开(公告)号：US11908657B2
公开(公告)日：2024-02-20
申请号：US17646195
申请日：2021-12-28
发明人： Qinglang Meng , Weiqiang Sun
IPC分类号： H01J37/21 , G01N23/2251 , H01J37/141 , H01J37/147 , H01J37/26 , H01J37/28
CPC分类号： H01J37/21 , G01N23/2251 , H01J37/141 , H01J37/1477 , H01J37/263 , H01J37/28 , H01J2237/06375 , H01J2237/141 , H01J2237/1415 , H01J2237/1516 , H01J2237/2448 , H01J2237/24475 , H01J2237/2817
摘要： A scanning electron microscope device for a sample to be detected and an electron beam inspection apparatus are provided, the scanning electron microscope device being configured to project electron beam to a surface of the sample to generate backscattered electrons and secondary electrons, and comprising: an electron beam source, a deflection mechanism, and an objective lens assembly. The deflection mechanism comprises a first deflector located downstream the electron beam source and a second deflector located downstream the first deflector. The objective lens assembly comprises: an excitation coil; and a magnetic yoke, formed by a magnetizer material as a housing which opens towards the sample and comprising a hollow body defining an internal chamber where the excitation coil is accommodated, and at least one inclined portion extending inward from the hollow body at an angle with reference to the hollow body and directing towards the optical axis, with an end of the at least one inclined portion being formed into a pole piece. The deflection mechanism further comprises a compensation electrode, which is located between the pole piece and the surface of the sample and is configured to adjust a focusing position of the electron beam at which the electron beam is focused, in a condition of excitation thereof with a voltage being applied thereon, by adjusting the voltage.
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公开(公告)号：US20240014000A1
公开(公告)日：2024-01-11
申请号：US17862052
申请日：2022-07-11
申请人： KLA Corporation
发明人： Alan D. Brodie , Lawrence P. Muray , John Gerling
IPC分类号： H01J37/141 , H01J37/153
CPC分类号： H01J37/141 , H01J37/153 , H01J37/147
摘要： A miniature electron optical column apparatus is disclosed. The apparatus may include a set of electron-optical elements configured to direct a primary electron beam to a sample. The set of electron-optical elements may include an objective lens. The apparatus may also include a deflection sub-system. The deflection sub-system may include one or more pre-lens deflectors positioned between an electron beam source and the objective lens. The deflection sub-system may also include a post-lens deflector positioned between the objective lens and the sample. The deflection sub-system may also include a post-lens miniature optical element positioned between the objective lens and the sample.
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公开(公告)号：US20240006148A1
公开(公告)日：2024-01-04
申请号：US18031358
申请日：2021-01-12
发明人： Hirokazu TAMAKI , Yudai KUBO
IPC分类号： H01J37/153 , H01J37/147 , H01J37/141
CPC分类号： H01J37/153 , H01J2237/1534 , H01J37/141 , H01J37/1471
摘要： An aberration corrector includes: a first multipole and a second multipole configured to form a hexapole field; and a transfer optics including a plurality of round lenses. The transfer optics is disposed between the first multipole and the second multipole, and acts on a charged particle beam such that an absolute value of a slope of the charged particle beam passing through the first multipole is different from an absolute value of a slope of the charged particle beam passing through the second multipole.
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6.发明授权公开(公告)号：US11769650B2
公开(公告)日：2023-09-26
申请号：US17297581
申请日：2019-12-23
发明人： Hideto Dohi , Yoshinobu Ootaka , Masashi Inada , Hideyuki Kazumi , Hideo Kashima
IPC分类号： H01J37/28 , H01J37/141 , H01J37/147 , H01J37/153
CPC分类号： H01J37/28 , H01J37/1413 , H01J37/1474 , H01J37/153 , H01J2237/032 , H01J2237/1534
摘要： Provided are a multistage-connected multipole and a charged particle beam device that can be produced with precision in machining without requiring precision in brazing between a pole and an insulation material. This multi-stage connected multipole 100 comprises: a plurality of poles Q1-Q4 that are arranged along the optical-axis direction of a charged particle beam, and that have cutouts Non surfaces facing each other; and braces P1-P3 that are arranged between the plurality of poles Q1-Q4 and are made of an insulator. The poles Q1-Q4 and the braces P1-P3 are joined by fitting the braces P1-P3 into the cutouts N and applying brazing so as to be interposed by a bonding material.
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公开(公告)号：US11769649B2
公开(公告)日：2023-09-26
申请号：US17576156
申请日：2022-01-14
发明人： Masanori Mita , Yoshinobu Ootaka , Hideto Dohi , Zhaohui Cheng
IPC分类号： H01J37/153 , H01J37/141 , H01J37/147
CPC分类号： H01J37/153 , H01J37/1413 , H01J37/1474 , H01J2237/141 , H01J2237/1415 , H01J2237/1534
摘要： An object is to provide a multipole unit capable of achieving both high positional accuracy and ease of assembling and preventing a decrease in the transmission rate of the magnetic flux. A multipole unit 109a includes a pole 1 that is made of a soft magnetic metal material, a shaft 2 that is made of a soft magnetic metal material and is magnetically connected to the pole, and a coil 3 that is wound around the shaft 2. The pole 1 is provided with a first fitting portion JP1 that forms a first recessed portion or a first protruding portion. The shaft 2 is provided with a second fitting portion JP2 that forms a second protruding portion or a second recessed portion. The first fitting portion JP1 and the second fitting portion JP2 are fitted with each other such that the pole 1 and the shaft 2 are physically separated from each other.
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公开(公告)号：US11640897B2
公开(公告)日：2023-05-02
申请号：US16641870
申请日：2017-09-04
IPC分类号： H01J37/28 , H01J37/141 , H01J37/20 , H01J37/244
摘要： The present invention provides a charged particle beam apparatus capable of efficiently reducing the effect of a residual magnetic field when SEM observation is performed. The charged particle beam apparatus according to the present invention includes a first mode for passing a direct current to a second coil after turning off a first coil, and a second mode for passing an alternating current to the second coil after turning off the first coil.
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公开(公告)号：US11640894B2
公开(公告)日：2023-05-02
申请号：US16682421
申请日：2019-11-13
申请人： JEOL Ltd.
发明人： Toshikatsu Kaneyama
IPC分类号： H01J37/141
摘要： A charged particle beam apparatus that includes a magnetic lens having an electromagnetic coil composed of a pair of coils includes: a setting unit that sets a maximum current value that defines a maximum magnetomotive force of the magnetic lens based on an operation of a user; and a current control unit that controls a current to be supplied to each of the pair of coils within a current range corresponding to a set maximum current value so that thermal power consumed by the electromagnetic coil is maintained constant at thermal power corresponding to the set maximum current value.
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公开(公告)号：US11636996B2
公开(公告)日：2023-04-25
申请号：US17465068
申请日：2021-09-02
申请人： KLA Corporation
IPC分类号： H01J37/141 , H01J37/075
摘要： The present disclosure provides a magnetic immersion electron gun and a method of generating an electron beam using a magnetic immersion electron gun. The electron gun includes a magnetic lens forming a magnetic field, a cathode tip disposed in the magnetic field, and a multi-filament heater configured to directly heat the cathode tip to emit electrons through the magnetic lens. The multi-filament heater includes a first filament connected at each end to first and second positive terminals of a power source and a second filament connected at each end to first and second negative terminals of the power source. The first positive terminal, the second positive terminal, the first negative terminal, and the second negative terminal are arranged alternately around the cathode tip such that the first filament and the second filament intersect at the cathode tip and a resultant magnetic force applied to the cathode tip is reduced.
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