公开(公告)号：US20240429016A1

公开(公告)日：2024-12-26

申请号：US18697006

申请日：2022-09-27

Applicant: OKINAWA INSTITUTE OF SCIENCE AND TECHNOLOGY SCHOOL CORPORATION

Inventor： Makoto Tokoro SCHREIBER ,  Matthias WOLF ,  Cathal CASSIDY

IPC: H01J37/141 ,  H01J37/26

Abstract: Techniques are described for a charged particle optical apparatus that includes a loop of solid material that encloses a bore and a wire winding poloidally wrapped around the loop surrounding the bore. A current is applied to the toroidal winding generating a magnetic field inside the loop along a toroidal direction of the loop and generating magnetic vector potential within the bore. When charged particle(s) pass through the bore of the loop, the magnetic vector potential focuses the charged particles based on the focal point of the charged particle optical apparatus.

公开(公告)号：US12154757B2

公开(公告)日：2024-11-26

申请号：US17750569

申请日：2022-05-23

Applicant: FEI COMPANY

Inventor： Jeremy Graham

IPC: H01J37/304 ,  H01J37/141 ,  H01J37/147 ,  H01J37/21 ,  H01J37/26 ,  H01J37/28 ,  H01J37/05

Abstract: Disclosed herein are scientific instrument support systems, as well as related methods, apparatus, computing devices, and computer-readable media. For example, some embodiments provide a scientific instrument comprising an ion-beam instrument configured to generate an ion beam including first and second sub-beams; an electron-beam instrument including a charged-particle-beam (CPB) lens having an adjustable setting controlling a magnetic force applied to the first and second sub-beams; and a computing device. The computing device is configured to: acquire an image by causing the ion-beam instrument to scan the ion beam across a sample using a selected setting of the CPB lens of the electron-beam instrument, apply automated image processing to the image to quantify an amount of spatial misalignment of the first and second sub-beams at the sample, and control the CPB lens of the electron-beam instrument to a setting based on the amount of spatial misalignment within the image.

公开(公告)号：US12125671B2

公开(公告)日：2024-10-22

申请号：US17778036

申请日：2020-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Stijn Wilem Herman Karel Steenbrink ,  Marco Jan-Jaco Wieland ,  Albertus Victor Gerardus Mangnus

IPC: H01J37/317 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/3177 ,  H01J37/141 ,  H01J37/1474 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/2817

Abstract: A multi-source illumination apparatus for illuminating a sample with charged particles, wherein beams, from a plurality of sources, are arranged such that a beam from at least one source intersects, at a plane of a condenser lens, with at least part of one other beam from a different one of the plurality of sources. The condenser lens is configured to separately collimate the received beams from each source. A manipulator array arrangement is configured to manipulate the collimated beams to generate one or more beams, in a single column, that include charged particles from the plurality of sources. The manipulator array arrangement includes a multi-beam generator configured to receive the plurality of substantially parallel substantially collimated beams generated by the deflector array, and generate a multibeam in dependence on the received plurality of substantially parallel substantially collimated beams, wherein the multi-beam includes a plurality of substantially collimated sub-beams.

公开(公告)号：US11908658B2

公开(公告)日：2024-02-20

申请号：US17645859

申请日：2021-12-23

Applicant: Zhongke Jingyuan Electron Limited, Beijing (CN)

Inventor： Qinglang Meng ,  Weiqiang Sun

IPC: H01J37/28 ,  H01J37/09 ,  H01J37/141 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/09 ,  H01J37/141 ,  H01J37/147 ,  H01J37/244

Abstract: A scanning electron microscope device for a sample to be detected and an electron beam inspection apparatus are provided, the scanning electron microscope device being configured to project electron beam to a surface of the sample to generate backscattered electrons and secondary electrons, and comprising: an electron beam source, a deflection mechanism, and an objective lens assembly. The deflection mechanism comprises a first deflector located downstream the electron beam source and a second deflector located downstream the first deflector. The objective lens assembly comprises: an excitation coil; and a magnetic yoke, formed by a magnetizer material as a housing which opens towards the sample and comprising a hollow body defining an internal chamber where the excitation coil is accommodated, and at least one inclined portion extending inward from the hollow body at an angle with reference to the hollow body and directing towards the optical axis, with an end of the at least one inclined portion being formed into a pole piece. The deflection mechanism further comprises a third deflector located between the second deflector and the objective lens assembly and disposed in an opening delimited and circumscribed by the pole piece, and each of the first deflector, the second deflector and the third deflector is an electrostatic deflector.

公开(公告)号：US11908657B2

公开(公告)日：2024-02-20

申请号：US17646195

申请日：2021-12-28

Applicant: ZHONGKE JINGYUAN ELECTRON LIMITED

Inventor： Qinglang Meng ,  Weiqiang Sun

IPC: H01J37/21 ,  G01N23/2251 ,  H01J37/141 ,  H01J37/147 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/21 ,  G01N23/2251 ,  H01J37/141 ,  H01J37/1477 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/06375 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/1516 ,  H01J2237/2448 ,  H01J2237/24475 ,  H01J2237/2817

Abstract: A scanning electron microscope device for a sample to be detected and an electron beam inspection apparatus are provided, the scanning electron microscope device being configured to project electron beam to a surface of the sample to generate backscattered electrons and secondary electrons, and comprising: an electron beam source, a deflection mechanism, and an objective lens assembly. The deflection mechanism comprises a first deflector located downstream the electron beam source and a second deflector located downstream the first deflector. The objective lens assembly comprises: an excitation coil; and a magnetic yoke, formed by a magnetizer material as a housing which opens towards the sample and comprising a hollow body defining an internal chamber where the excitation coil is accommodated, and at least one inclined portion extending inward from the hollow body at an angle with reference to the hollow body and directing towards the optical axis, with an end of the at least one inclined portion being formed into a pole piece. The deflection mechanism further comprises a compensation electrode, which is located between the pole piece and the surface of the sample and is configured to adjust a focusing position of the electron beam at which the electron beam is focused, in a condition of excitation thereof with a voltage being applied thereon, by adjusting the voltage.

公开(公告)号：US20240014000A1

公开(公告)日：2024-01-11

申请号：US17862052

申请日：2022-07-11

Applicant: KLA Corporation

Inventor： Alan D. Brodie ,  Lawrence P. Muray ,  John Gerling

IPC: H01J37/141 ,  H01J37/153

CPC classification number: H01J37/141 ,  H01J37/153 ,  H01J37/147

Abstract: A miniature electron optical column apparatus is disclosed. The apparatus may include a set of electron-optical elements configured to direct a primary electron beam to a sample. The set of electron-optical elements may include an objective lens. The apparatus may also include a deflection sub-system. The deflection sub-system may include one or more pre-lens deflectors positioned between an electron beam source and the objective lens. The deflection sub-system may also include a post-lens deflector positioned between the objective lens and the sample. The deflection sub-system may also include a post-lens miniature optical element positioned between the objective lens and the sample.

公开(公告)号：US20240006148A1

公开(公告)日：2024-01-04

申请号：US18031358

申请日：2021-01-12

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Hirokazu TAMAKI ,  Yudai KUBO

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/141

CPC classification number: H01J37/153 ,  H01J2237/1534 ,  H01J37/141 ,  H01J37/1471

Abstract: An aberration corrector includes: a first multipole and a second multipole configured to form a hexapole field; and a transfer optics including a plurality of round lenses. The transfer optics is disposed between the first multipole and the second multipole, and acts on a charged particle beam such that an absolute value of a slope of the charged particle beam passing through the first multipole is different from an absolute value of a slope of the charged particle beam passing through the second multipole.

公开(公告)号：US11769650B2

公开(公告)日：2023-09-26

申请号：US17297581

申请日：2019-12-23

Applicant: Hitachi High-Tech Corporation

Inventor： Hideto Dohi ,  Yoshinobu Ootaka ,  Masashi Inada ,  Hideyuki Kazumi ,  Hideo Kashima

IPC: H01J37/28 ,  H01J37/141 ,  H01J37/147 ,  H01J37/153

CPC classification number: H01J37/28 ,  H01J37/1413 ,  H01J37/1474 ,  H01J37/153 ,  H01J2237/032 ,  H01J2237/1534

Abstract: Provided are a multistage-connected multipole and a charged particle beam device that can be produced with precision in machining without requiring precision in brazing between a pole and an insulation material. This multi-stage connected multipole 100 comprises: a plurality of poles Q1-Q4 that are arranged along the optical-axis direction of a charged particle beam, and that have cutouts Non surfaces facing each other; and braces P1-P3 that are arranged between the plurality of poles Q1-Q4 and are made of an insulator. The poles Q1-Q4 and the braces P1-P3 are joined by fitting the braces P1-P3 into the cutouts N and applying brazing so as to be interposed by a bonding material.

公开(公告)号：US11769649B2

公开(公告)日：2023-09-26

申请号：US17576156

申请日：2022-01-14

Applicant: Hitachi High-Tech Corporation

Inventor： Masanori Mita ,  Yoshinobu Ootaka ,  Hideto Dohi ,  Zhaohui Cheng

IPC: H01J37/153 ,  H01J37/141 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/1413 ,  H01J37/1474 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/1534

Abstract: An object is to provide a multipole unit capable of achieving both high positional accuracy and ease of assembling and preventing a decrease in the transmission rate of the magnetic flux. A multipole unit 109a includes a pole 1 that is made of a soft magnetic metal material, a shaft 2 that is made of a soft magnetic metal material and is magnetically connected to the pole, and a coil 3 that is wound around the shaft 2. The pole 1 is provided with a first fitting portion JP1 that forms a first recessed portion or a first protruding portion. The shaft 2 is provided with a second fitting portion JP2 that forms a second protruding portion or a second recessed portion. The first fitting portion JP1 and the second fitting portion JP2 are fitted with each other such that the pole 1 and the shaft 2 are physically separated from each other.

公开(公告)号：US11640897B2

公开(公告)日：2023-05-02

申请号：US16641870

申请日：2017-09-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Ryo Hirano ,  Tsunenori Nomaguchi ,  Chisato Kamiya ,  Junichi Katane

IPC: H01J37/28 ,  H01J37/141 ,  H01J37/20 ,  H01J37/244

Abstract: The present invention provides a charged particle beam apparatus capable of efficiently reducing the effect of a residual magnetic field when SEM observation is performed. The charged particle beam apparatus according to the present invention includes a first mode for passing a direct current to a second coil after turning off a first coil, and a second mode for passing an alternating current to the second coil after turning off the first coil.