Invention Application
US20160056172A1 VERTICALLY-INTEGRATED NONVOLATILE MEMORY DEVICES HAVING LATERALLY-INTEGRATED GROUND SELECT TRANSISTORS 审中-公开
具有横向集成式接地选择晶体管的垂直集成非易失性存储器件

  • Patent Title: VERTICALLY-INTEGRATED NONVOLATILE MEMORY DEVICES HAVING LATERALLY-INTEGRATED GROUND SELECT TRANSISTORS
  • Patent Title (中): 具有横向集成式接地选择晶体管的垂直集成非易失性存储器件
  • Application No.: US14921845
    Application Date: 2015-10-23
  • Publication No.: US20160056172A1
    Publication Date: 2016-02-25
  • Inventor: Sunil ShimJaehun JeongJaehoon JangKihyun Kim
  • Applicant: Samsung Electronics Co., Ltd.
  • Priority: KR10-2009-0010546 20090210; KR10-2010-0083682 20100827
  • Main IPC: H01L27/115
  • IPC: H01L27/115
VERTICALLY-INTEGRATED NONVOLATILE MEMORY DEVICES HAVING LATERALLY-INTEGRATED GROUND SELECT TRANSISTORS
Abstract:
Nonvolatile memory devices utilize vertically-stacked strings of nonvolatile memory cells (e.g., NAND-type strings) that can be selectively coupled to common source lines within a substrate. This selective coupling may be provided by lateral ground select transistors having different threshold voltages that account for different lateral spacings between the vertically-stacked strings of nonvolatile memory cells and the common source lines.
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