Some novel features pertain to an integrated device that includes a substrate, several lower level metal layers, several lower level dielectric layers, and a redistribution portion. The redistribution portion includes a first dielectric layer that includes a first dielectric thickness, and an electromagnetic (EM) passive device that includes a first redistribution interconnect. The first redistribution interconnect includes a first redistribution thickness, where the first dielectric thickness is at least about 2 times greater than the first redistribution thickness. In some implementations, the redistribution portion includes a radio frequency (RF) shield. In some implementations, the RF shield is located between a passivation layer and the several lower level dielectric layers. The RF shield is located between the EM passive device and the several lower level dielectric layers. The RF shield is electrically coupled to an interconnect configured to provide an electrical path for a ground signal.