发明申请
US20160059272A1 Cleaning Method And Composition In Photolithography 有权
清洁方法和光刻中的组成

Cleaning Method And Composition In Photolithography
摘要:
The present disclosure provides one embodiment of a method. The method includes applying a first cleaning fluid to a substrate, thereby cleaning the substrate and forming a protection layer on the substrate; and applying a removing process to the substrate, thereby removing the protection layer from the substrate. The first cleaning fluid includes a cleaning chemical, a protection additive and a solvent.
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