发明申请
- 专利标题: Cleaning Method And Composition In Photolithography
- 专利标题(中): 清洁方法和光刻中的组成
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申请号: US14471738申请日: 2014-08-28
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公开(公告)号: US20160059272A1公开(公告)日: 2016-03-03
- 发明人: Ya-Ling Cheng , Chien-Wei Wang
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 主分类号: B08B3/08
- IPC分类号: B08B3/08 ; H01L21/02
摘要:
The present disclosure provides one embodiment of a method. The method includes applying a first cleaning fluid to a substrate, thereby cleaning the substrate and forming a protection layer on the substrate; and applying a removing process to the substrate, thereby removing the protection layer from the substrate. The first cleaning fluid includes a cleaning chemical, a protection additive and a solvent.
公开/授权文献
- US09589785B2 Cleaning method and composition in photolithography 公开/授权日:2017-03-07