The present invention provides an imprint apparatus which performs an imprint process for forming a pattern on an imprint material on a substrate using a mold, the apparatus including an obtaining unit configured to obtain each shape of a plurality of shot regions on the substrate before the mold and the shot region as an imprint target on the substrate face each other, a first correction unit configured to correct, for each shot region on the substrate, a shape difference between a pattern of the mold and the shot region, a measurement unit configured to measure a displacement between the pattern of the mold and the shot region on the substrate, a second correction unit configured to correct the displacement, and a control unit configured to control the imprint process.