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公开(公告)号：US20160075076A1
公开(公告)日：2016-03-17
申请号：US14835147
申请日：2015-08-25
IPC分类号： B29C59/02
CPC分类号： G03F7/0002
摘要： The present invention provides an imprint apparatus which performs an imprint process for forming a pattern on an imprint material on a substrate using a mold, the apparatus including an obtaining unit configured to obtain each shape of a plurality of shot regions on the substrate before the mold and the shot region as an imprint target on the substrate face each other, a first correction unit configured to correct, for each shot region on the substrate, a shape difference between a pattern of the mold and the shot region, a measurement unit configured to measure a displacement between the pattern of the mold and the shot region on the substrate, a second correction unit configured to correct the displacement, and a control unit configured to control the imprint process.
摘要翻译： 本发明提供了一种压印装置，其使用模具进行用于在基板上的压印材料上形成图案的压印处理，该装置包括获取单元，其被配置为在模具之前在基板上获得多个拍摄区域的各个形状 并且作为基板上的印模对象的拍摄区域彼此面对，第一校正单元，被配置为对于基板上的每个拍摄区域校正模具和拍摄区域的图案之间的形状差异;测量单元，被配置为 测量模具的图案与基板上的拍摄区域之间的位移，被配置为校正位移的第二校正单元和被配置为控制压印处理的控制单元。
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公开(公告)号：US20200004139A1
公开(公告)日：2020-01-02
申请号：US16450000
申请日：2019-06-24
发明人： Hiroshi Sato , Hiroshi Morohoshi
IPC分类号： G03F7/00
摘要： A method for forming a pattern of an imprint material on a shot region of a substrate by using a mold, includes determining a plurality of marks for alignment of the shot region and the mold, performing measurement for the alignment using the plurality of marks determined in the determining, setting an origin position of a coordinate system for acquisition of an alignment error between the shot region and the mold based on an arrangement of the plurality of marks determined in the determining, and acquiring the alignment error based on a measurement result in the measurement and the origin position determined in the setting.
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3.发明申请IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING ARTICLE 审中-公开IMPRINT APPARATUS，IMPRINT METHOD，AND METHOD OF MANUFACTURING ARTICLE公开(公告)号：US20150343679A1
公开(公告)日：2015-12-03
申请号：US14717226
申请日：2015-05-20
发明人： Hiroshi Morohoshi
CPC分类号： B29C43/58 , B29C43/18 , G03F7/0002
摘要： The present invention provides an imprint apparatus that forms an imprint material supplied on a shot region of a substrate by using a mold, comprising a detection unit configured to detect each mark provided to the shot region and each mark provided to the mold, and a control unit configured to perform alignment between the mold and the substrate based on a detection result by the detection unit, wherein the control unit obtains a predicted value of a position of a mark provided to the shot region by using information about deformation of the shot region, determines, as an abnormal mark, a mark for which a difference between the detection result and the predicted value does not fall within an allowable range and performs the alignment without using the detection result for the abnormal mark.
摘要翻译： 本发明提供了一种压印装置，其通过使用模具形成在基板的射出区域上提供的压印材料，所述压印装置包括检测单元，所述检测单元被配置为检测提供给所述注射区域的每个标记以及提供给所述模具的每个标记， 单元，其被配置为基于所述检测单元的检测结果来执行所述模具和所述基板之间的对准，其中所述控制单元通过使用关于所述拍摄区域的变形的信息来获得提供给所述拍摄区域的标记的位置的预测值， 将检测结果和预测值之间的差不在容许范围内的标记作为异常标记，并且在不使用异常标记的检测结果的情况下进行取向。
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公开(公告)号：US11131924B2
公开(公告)日：2021-09-28
申请号：US16450000
申请日：2019-06-24
发明人： Hiroshi Sato , Hiroshi Morohoshi
IPC分类号： G03F7/00
摘要： A method for forming a pattern of an imprint material on a shot region of a substrate by using a mold, includes determining a plurality of marks for alignment of the shot region and the mold, performing measurement for the alignment using the plurality of marks determined in the determining, setting an origin position of a coordinate system for acquisition of an alignment error between the shot region and the mold based on an arrangement of the plurality of marks determined in the determining, and acquiring the alignment error based on a measurement result in the measurement and the origin position determined in the setting.
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公开(公告)号：US10331027B2
公开(公告)日：2019-06-25
申请号：US14835147
申请日：2015-08-25
摘要： The present invention provides an imprint apparatus which performs an imprint process for forming a pattern on an imprint material on a substrate using a mold, the apparatus including an obtaining unit configured to obtain each shape of a plurality of shot regions on the substrate before the mold and the shot region as an imprint target on the substrate face each other, a first correction unit configured to correct, for each shot region on the substrate, a shape difference between a pattern of the mold and the shot region, a measurement unit configured to measure a displacement between the pattern of the mold and the shot region on the substrate, a second correction unit configured to correct the displacement, and a control unit configured to control the imprint process.
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公开(公告)号：US10059045B2
公开(公告)日：2018-08-28
申请号：US14717226
申请日：2015-05-20
发明人： Hiroshi Morohoshi
CPC分类号： B29C43/58 , B29C43/18 , G03F7/0002
摘要： The present invention provides an imprint apparatus that forms an imprint material supplied on a shot region of a substrate by using a mold, comprising a detection unit configured to detect each mark provided to the shot region and each mark provided to the mold, and a control unit configured to perform alignment between the mold and the substrate based on a detection result by the detection unit, wherein the control unit obtains a predicted value of a position of a mark provided to the shot region by using information about deformation of the shot region, determines, as an abnormal mark, a mark for which a difference between the detection result and the predicted value does not fall within an allowable range and performs the alignment without using the detection result for the abnormal mark.
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