Invention Application
US20160075560A1 METHOD FOR PRODUCING GRAPHENE 有权
生产石墨的方法

METHOD FOR PRODUCING GRAPHENE
Abstract:
A graphene producing method which is capable of increasing a size of each domain of graphene. A plasma CVD film formation device that activates a catalyst metal layer formed on a wafer; modifies the same into an activated catalyst metal layer; decomposes a C2H4 gas as a low reactivity carbon-containing gas by plasma in a space that opposes the wafer; and decomposes a C2H2 gas as a high reactivity carbon-containing gas by heat in the space.
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