Invention Application
- Patent Title: LOW=VOC CLEANING SUBSTRATES AND COMPOSITIONS
- Patent Title (中): LOW = VOC清洁基材和组合物
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Application No.: US14954663Application Date: 2015-11-30
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Publication No.: US20160075978A1Publication Date: 2016-03-17
- Inventor: Janiece Hope , Nancy A. Falk , Wenyu Zhang , Jared Heymann , Mona Marie Knock , Mike Kinsinger , Bernard Hill , Vidya Ananth
- Applicant: THE CLOROX COMPANY
- Applicant Address: US CA OAKLAND
- Assignee: THE CLOROX COMPANY
- Current Assignee: THE CLOROX COMPANY
- Current Assignee Address: US CA OAKLAND
- Main IPC: C11D3/48
- IPC: C11D3/48 ; C11D1/66 ; C11D3/43

Abstract:
A cleaning composition for sanitizing and/or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.
Public/Granted literature
- US09988594B2 Low-VOC cleaning substrates and compositions containing a non-ionic surfactant Public/Granted day:2018-06-05
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