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14 条记录 (耗时 0.019 秒)

    Bleach compositions
    3.
    发明授权
    Bleach compositions 有权

    公开(公告)号：US10986841B2

    公开(公告)日：2021-04-27

    申请号：US16182415

    申请日：2018-11-06

    申请人： The Clorox Company

    发明人： Marisa Macnaughtan ,  Nipa Modi ,  Thomas Fahlen ,  Wenyu Zhang ,  Ashley Joseph ,  Timothy Mui

    IPC分类号： A01N59/00 ,  A61L2/18 ,  A01N25/30 ,  A01N25/02 ,  C11D3/48 ,  C11D1/75 ,  C11D1/62 ,  C11D1/835 ,  C11D1/72

    摘要： Sanitizing and disinfecting compositions with relatively low levels of free available chlorine, with good effectiveness against microbes. The composition may include less than 0.5% by weight hypochlorite or other free available chlorine level, at least one nonionic or zwitterionic surfactant, with a pH from 8 to 12.5. The composition is characterized by an R value of greater than 0 (e.g., greater than 0.5, or equal to 1), where R is defined as the sum of the concentration of any nonionic, zwitterionic, and cationic surfactants divided by the total surfactant concentration (and total surfactant concentration may include any surfactant aids). The compositions may exhibit at least a 3-log reduction in M. bovis or C. diff population within 10 minutes (e.g., 4-6 minutes).

    BLEACH COMPOSITIONS
    4.
    发明申请
    BLEACH COMPOSITIONS 有权

    公开(公告)号：US20210059258A1

    公开(公告)日：2021-03-04

    申请号：US17096852

    申请日：2020-11-12

    申请人： The Clorox Company

    发明人： Marisa Macnaughtan ,  Nipa Modi ,  Thomas Fahlen ,  Wenyu Zhang ,  Ashley Joseph ,  Timothy Mui

    IPC分类号： A01N59/00 ,  A61L2/18 ,  C11D3/48 ,  C11D1/75 ,  A01N25/30 ,  C11D1/62 ,  C11D1/835 ,  A01N25/02 ,  C11D1/72

    摘要： Sanitizing and disinfecting compositions with relatively low levels of free available chlorine, with good effectiveness against microbes. The composition may include less than 0.5% by weight hypochlorite or other free available chlorine level, at least one nonionic or zwitterionic surfactant, with a pH from 8 to 12.5. The composition is characterized by an R value of greater than 0 (e.g., greater than 0.5, or equal to 1), where R is defined as the sum of the concentration of any nonionic, zwitterionic, and cationic surfactants divided by the total surfactant concentration (and total surfactant concentration may include any surfactant aids). The compositions may exhibit at least a 3-log reduction in M. bovis or C. diff population within 10 minutes (e.g., 4-6 minutes).

    BLEACH COMPOSITIONS
    5.
    发明申请
    BLEACH COMPOSITIONS 有权

    公开(公告)号：US20210059257A1

    公开(公告)日：2021-03-04

    申请号：US17096816

    申请日：2020-11-12

    申请人： The Clorox Company

    发明人： Marisa Macnaughtan ,  Nipa Modi ,  Thomas Fahlen ,  Wenyu Zhang ,  Ashley Joseph ,  Timothy Mui

    IPC分类号： A01N59/00 ,  A61L2/18 ,  C11D3/48 ,  C11D1/75 ,  A01N25/30 ,  C11D1/62 ,  C11D1/835 ,  A01N25/02 ,  C11D1/72

    摘要： Sanitizing and disinfecting compositions with relatively low levels of free available chlorine, with good effectiveness against microbes. The composition may include less than 0.5% by weight hypochlorite or other free available chlorine level, at least one nonionic or zwitterionic surfactant, with a pH from 8 to 12.5. The composition is characterized by an R value of greater than 0 (e.g., greater than 0.5, or equal to 1), where R is defined as the sum of the concentration of any nonionic, zwitterionic, and cationic surfactants divided by the total surfactant concentration (and total surfactant concentration may include any surfactant aids). The compositions may exhibit at least a 3-log reduction in M. bovis or C. diff population within 10 minutes (e.g., 4-6 minutes).

    Drain formulation for enhanced hair dissolution
    6.
    发明授权
    Drain formulation for enhanced hair dissolution 有权
    用于增强头发溶解的排水配方

    公开(公告)号：US09487742B2

    公开(公告)日：2016-11-08

    申请号：US13950140

    申请日：2013-07-24

    申请人： The Clorox Company

    发明人： Rashda Khan ,  Daniela Fritter ,  Lorinda Alcantara ,  Wenyu Zhang ,  Miranda Helmer

    IPC分类号： C11D1/75 ,  C11D3/04 ,  C11D3/395 ,  C11D17/00 ,  C11D3/30 ,  C11D3/20

    CPC分类号： C11D17/0026 ,  C11D1/75 ,  C11D3/044 ,  C11D3/2079 ,  C11D3/30 ,  C11D3/3951 ,  C11D3/3953 ,  C11D3/3956

    摘要： The invention relates to drain cleaning compositions including relatively high concentrations of a hypochlorite oxidizing agent and a hydroxide (e.g., 4 to 12% and 2.5 to 10%, respectively. The composition further includes a surfactant (e.g., a surfactant blend, water, and exhibits a very high pH (e.g., at least 13). The composition is monophasic, even at high oxidizing and hydroxide concentrations. The surfactant may include a blend of an uncharged surfactant (e.g., an amphoteric surfactant or nonionic surfactant) and a charged surfactant (e.g., anionic, cationic, or a surfactant that becomes so under the high pH conditions of the composition). The ratio of charged to uncharged surfactant may be at least 1:10, e.g., from 1:10 to about 1:50.

    摘要翻译： 本发明涉及排水清洗组合物，其包括相对高浓度的次氯酸盐氧化剂和氢氧化物（例如，分别为4至12％和2.5至10％。该组合物还包括表面活性剂（例如表面活性剂共混物，水和 表现出非常高的pH（例如至少13），甚至在高氧化性和氢氧化物浓度下，组合物是单相的，表面活性剂可以包括不带电表面活性剂（例如两性表面活性剂或非离子表面活性剂）和带电表面活性剂 （例如，在组合物的高pH条件下变成阴离子，阳离子或表面活性剂）。带电量与不带电表面活性剂的比例可以至少为1:10，例如从1:10至约1:50。

    LOW=VOC CLEANING SUBSTRATES AND COMPOSITIONS
    9.
    发明申请
    LOW=VOC CLEANING SUBSTRATES AND COMPOSITIONS 有权
    LOW = VOC清洁基材和组合物

    公开(公告)号：US20160075978A1

    公开(公告)日：2016-03-17

    申请号：US14954663

    申请日：2015-11-30

    申请人： THE CLOROX COMPANY

    发明人： Janiece Hope ,  Nancy A. Falk ,  Wenyu Zhang ,  Jared Heymann ,  Mona Marie Knock ,  Mike Kinsinger ,  Bernard Hill ,  Vidya Ananth

    IPC分类号： C11D3/48 ,  C11D1/66 ,  C11D3/43

    CPC分类号： C11D3/48 ,  A01N33/12 ,  A47L13/17 ,  C11D1/008 ,  C11D1/62 ,  C11D1/66 ,  C11D1/72 ,  C11D1/835 ,  C11D3/43

    摘要： A cleaning composition for sanitizing and/or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.

    摘要翻译： 一种用于消毒和/或消毒硬表面的清洁组合物，包括：阳离子杀生物剂，表面活性剂和低水平的VOC溶剂。 清洁组合物适于清洁各种硬表面，而不会留下可见的残留物，并在经处理的表面上产生低水平的条纹和成膜。 清洁组合物含有小于5重量％的VOC。 清洁组合物可以单独用作液体或喷雾制剂，或与基底组合使用，例如预先装载的清洁擦拭巾。

    Preloaded dual purpose cleaning and sanitizing wipe
    10.
    发明授权
    Preloaded dual purpose cleaning and sanitizing wipe 有权
    预装双重清洁和消毒擦拭

    公开(公告)号：US09096821B1

    公开(公告)日：2015-08-04

    申请号：US14449021

    申请日：2014-07-31

    申请人： The Clorox Company

    发明人： Janiece Hope ,  Nancy A. Falk ,  Wenyu Zhang ,  Jared Heymann ,  Mona Marie Knock ,  Mike Kinsinger ,  Bernard Hill ,  Vidya Ananth

    IPC分类号： C11D1/37 ,  C11D3/48 ,  C11D17/04 ,  C11D7/32 ,  C11D7/50

    CPC分类号： C11D1/65 ,  C11D1/62 ,  C11D1/94 ,  C11D3/201 ,  C11D3/2017 ,  C11D3/2068 ,  C11D3/43 ,  C11D3/48 ,  C11D17/049

    摘要： The invention relates to preloaded cleaning and sanitizing wipes comprising a nonwoven substrate, and a cleaning formulation loaded onto or within the nonwoven substrate. The cleaning composition may include about 0.001% to about 10% by weight of an antimicrobial compound comprising a quaternary ammonium compound, less than about 4% by weight of an alcohol solvent containing a single hydroxyl group, a preservative, about 0.05% to about 10% by weight of a glycol solvent (e.g., preferably a glycol ether solvent), about 0.05% to about 10% of one or more surfactants, and water. The composition may have a pH from about 4 to about 8.

    摘要翻译： 本发明涉及包含非织造基底的预加载的清洁和消毒擦拭物以及装载到非织造基底上或内部的清洁制剂。 清洁组合物可以包含约0.001重量％至约10重量％的包含季铵化合物的抗微生物化合物，小于约4重量％的含有单个羟基的醇溶剂，防腐剂，约0.05重量％至约10重量％ 二醇溶剂（例如，优选二醇醚溶剂），约0.05％至约10％的一种或多种表面活性剂和水的重量％。 组合物可以具有约4至约8的pH。