Invention Application
US20160083676A1 METHOD AND APPARATUS FOR HIGH EFFICIENCY POST CMP CLEAN USING ENGINEERED VISCOUS FLUID
审中-公开
使用工程粘度流体高效CMP后清洗的方法和装置
- Patent Title: METHOD AND APPARATUS FOR HIGH EFFICIENCY POST CMP CLEAN USING ENGINEERED VISCOUS FLUID
- Patent Title (中): 使用工程粘度流体高效CMP后清洗的方法和装置
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Application No.: US14840146Application Date: 2015-08-31
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Publication No.: US20160083676A1Publication Date: 2016-03-24
- Inventor: Ekaterina MIKHAYLICHENKO , Brian J. BROWN , Fred C. REDEKER
- Applicant: Applied Materials, Inc.
- Main IPC: C11D17/00
- IPC: C11D17/00 ; B08B1/00 ; B08B3/12 ; C11D3/04 ; C11D1/14 ; C11D3/20 ; C11D3/37 ; B08B3/04 ; B08B3/02
Abstract:
Embodiments of the present apparatus and methods for post CMP clean. More particularly, embodiments provide apparatus and methods for removing nano sized particles. One embodiment provides a method for cleaning a substrate. The method includes exposing the substrate to a viscoelastic fluid to remove small particles from the substrate. The viscoelastic fluid comprising a viscosity adjustor and an aqueous base.
Information query
