发明申请
US20160085145A1 METHOD FOR PRODUCING A BLANK OF FLUORINE-DOPED AND TITANIUM-DOPED GLASS HAVING A HIGH SILICIC-ACID CONTENT AND A BLANK PRODUCED ACCORDING TO THE METHOD
有权
用于生产具有高硅酸含量的氟化钆和钛酸盐玻璃的空白的方法和根据该方法生产的空白
- 专利标题： METHOD FOR PRODUCING A BLANK OF FLUORINE-DOPED AND TITANIUM-DOPED GLASS HAVING A HIGH SILICIC-ACID CONTENT AND A BLANK PRODUCED ACCORDING TO THE METHOD
- 专利标题（中）： 用于生产具有高硅酸含量的氟化钆和钛酸盐玻璃的空白的方法和根据该方法生产的空白
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申请号： US14862707申请日： 2015-09-23
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公开(公告)号： US20160085145A1公开(公告)日： 2016-03-24
- 发明人: Stefan OCHS , Klaus BECKER
- 申请人： Heraeus Quarzglas GmbH & Co. KG
- 优先权： EP14186139.3 20140924
- 主分类号： G03F1/22
- IPC分类号： G03F1/22 ; C03C3/04 ; C03B19/06
摘要：
A method for producing a silica glass blank co-doped with titanium and fluorine for use in EUV lithography includes (a) producing a TiO2—SiO2 soot body by flame hydrolysis of silicon- and titanium-containing precursor substances, (b) fluorinating the TiO2—SiO2 soot body to form a fluorine-doped TiO2—SiO2 soot body, (c) treating the fluorine-doped TiO2—SiO2 soot body in a water vapor-containing atmosphere to form a conditioned soot body, and (d) vitrifying the conditioned soot body to form the blank. The blank has an internal transmission of at least 60% in the wavelength range of 400 to 700 nm at a sample thickness of 10 mm, a mean OH content in the range of 10 to 100 wt. ppm and a mean fluorine content in the range of 2,500 to 10,000 wt. ppm. Titanium is present in the blank in the oxidation forms Ti3+ and Ti4+.
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