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1.发明申请BLANK OF TIO2-SIO2 GLASS FOR A MIRROR SUBSTRATE FOR USE IN EUV LITHOGRAPHY AND METHOD FOR THE PRODUCTION THEREOF 有权用于在EUV光刻中使用的镜面基底的TIO2-SIO2玻璃的空白及其生产方法公开(公告)号：US20150376049A1
公开(公告)日：2015-12-31
申请号：US14766276
申请日：2014-02-04
发明人： Stephan THOMAS , Klaus BECKER , Stefan OCHS
CPC分类号： C03C3/06 , C03B19/1453 , C03B19/1469 , C03B25/02 , C03B32/00 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03C2201/21 , C03C2201/23 , C03C2201/42 , C03C2203/40 , C03C2203/52 , G02B5/0891 , G03F7/70316 , G03F7/70958
摘要： A blank of TiO2—SiO2 glass for a mirror substrate for use in EUV lithography has a low need for adaptation to optimize the progression of the coefficient of thermal expansion, and consequently also the progression of the zero crossing temperature Tzc. The TiO2—SiO2 glass has at a mean value of the fictive temperature Tf in the range between 920° C. and 970° C. a dependence expressed as the differential quotient dTzc/dTf of its zero crossing temperature Tzc on the fictive temperature Tf of less than 0.3.
摘要翻译： 用于EUV光刻的用于镜面基板的TiO 2 -SiO 2玻璃的空白对于适应以优化热膨胀系数的进展以及因此也是过零点温度Tzc的进展的需求很低。 TiO 2 -SiO 2玻璃具有在920℃和970℃之间的范围内的假想温度Tf的平均值。表示为其过零点温度Tzc的差分商dTzc / dTf对虚构温度Tf的依赖关系 小于0.3。
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2.发明申请MIRROR BLANK FOR EUV LITHOGRAPHY WITHOUT EXPANSION UNDER EUV RADIATION 审中-公开用于EUV辐射下的扩展的非线性滤波器的MIRROR BLANK公开(公告)号：US20160320715A1
公开(公告)日：2016-11-03
申请号：US15024236
申请日：2014-09-10
发明人： Klaus BECKER , Stephan THOMAS
摘要： A substrate for an EUV mirror which contains a zero crossing temperature profile that departs from the statistical distribution is provided. A method for producing a substrate for an EUV mirror is also provided, in which the zero crossing temperature profile in the substrate is adapted to the operating temperature of the mirror. A lithography method using the substrate is also described.
摘要翻译： 提供了一种EUV镜的基板，其中包含偏离统计分布的零交叉温度曲线。 还提供了一种用于制造用于EUV反射镜的基板的方法，其中基板中的过零温度分布适应于反射镜的工作温度。 还描述了使用该基板的光刻方法。
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3.发明申请METHOD FOR PRODUCING TITANIUM-DOPED SILICA GLASS FOR USE IN EUV LITHOGRAPHY AND BLANK PRODUCED IN ACCORDANCE THEREWITH 有权用于生产钛酸二氧化硅玻璃的方法，用于根据其生产的EUV光刻和空白公开(公告)号：US20160185645A1
公开(公告)日：2016-06-30
申请号：US14911506
申请日：2014-07-22
发明人： Stefan OCHS , Klaus BECKER , Stephan THOMAS
CPC分类号： C03B19/1461 , C03B19/1453 , C03B2201/075 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C3/00 , C03C3/06 , C03C4/0085 , C03C2201/12 , C03C2201/23 , C03C2201/42 , C03C2203/46 , C03C2203/52 , C03C2204/00 , G03F1/52 , G03F1/60
摘要： The Ti3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti3+ ions in favor of Ti4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO2—SiO2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti3+/Ti4+≦5×10−4.
摘要翻译： Ti掺杂的二氧化硅玻璃中存在的Ti3 +离子会引起玻璃的棕色染色，导致镜片检查变得更加困难。 在Ti掺杂的二氧化硅玻璃中减少Ti3 +离子有利于Ti4 +离子的已知方法包括足够高比例的OH基，并在玻璃化之前进行氧处理，这两者都有缺点。 为了提供一种Ti掺杂石英玻璃的成本有效的制造方法，其在羟基含量小于120ppm时，在400nm的波长范围内显示出至少70％的内部透射率（样品厚度10mm） 在玻璃化之前，将TiO 2 -SiO 2烟炱体用氮氧化物进行调理处理。 由Ti掺杂的石英玻璃制成的坯料的比例为Ti3 + / Ti4 +＆nlE; 5×10-4。
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4.发明申请METHOD FOR PRODUCING A BLANK FROM TITANIUM- AND FLUORINE-DOPED GLASS HAVING A HIGH SILICIC-ACID CONTENT 审中-公开从具有高硅酸含量的钛和氟树脂玻璃生产空白的方法公开(公告)号：US20160264447A1
公开(公告)日：2016-09-15
申请号：US15035776
申请日：2014-11-06
发明人： Stefan OCHS , Klaus BECKER
CPC分类号： C03B19/1461 , C03B19/066 , C03B19/106 , C03B19/1095 , C03B19/14 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C4/0085 , C03C2201/12 , C03C2201/42 , C03C2203/40 , C03C2203/54 , C03C2204/00 , G03F1/24
摘要： A method for producing a blank from titanium-doped, highly silicic-acidic glass having a specified fluorine content for use in EUV lithography is described, in which the thermal expansion coefficient over the operating temperature remains at zero as stably as possible. The course of the thermal expansion coefficient of Ti-doped silica glass depends on a plurality of influencing factors. In addition to the absolute titanium content, the distribution of the titanium is of significant importance, as is the ratio and distribution of additional doping elements, such as fluorine. In the method, fluorine-doped TiO2—SiO2 soot particles are generated and processed further via consolidation and vitrifying into the blank, and, by flame hydrolysis of input substances containing silicon and titanium, TiO2—SiO2-soot particles are formed, exposed to a reagent containing fluorine in a moving powder bed, and converted to the fluorine-doped TiO2—SiO2-soot particles.
摘要翻译： 描述了在EUV光刻中使用具有指定氟含量的钛掺杂的高硅酸性玻璃制造坯料的方法，其中在工作温度下的热膨胀系数尽可能稳定地保持在零。 Ti掺杂石英玻璃的热膨胀系数取决于多个影响因素。 除了绝对的钛含量之外，钛的分布是重要的，附加的掺杂元素如氟的比例和分布也是重要的。 在该方法中，通过固化和玻璃化进一步生成氟掺杂的TiO 2 -SiO 2烟灰颗粒到坯料中，并且通过含硅和钛的输入物质的火焰水解，形成TiO 2 -SiO 2 - 烟灰颗粒，暴露于 在移动的粉末床中含有氟的试剂，并转化成掺杂氟的TiO 2 -SiO 2 - 烟灰颗粒。
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5.发明申请METHOD FOR PRODUCING A MIRROR SUBSTRATE BLANK OF TITANIUM-DOPED SILICA GLASS FOR EUV LITHOGRAPHY, AND SYSTEM FOR DETERMINING THE POSITION OF DEFECTS IN A BLANK 有权用于制造用于EUV光刻的钛酸二氧化硅玻璃的镜面基板的方法和用于确定空白中缺陷位置的系统公开(公告)号：US20160151880A1
公开(公告)日：2016-06-02
申请号：US14903799
申请日：2014-07-02
发明人： Klaus BECKER
IPC分类号： B24B49/12 , G01N21/88 , G01N21/958 , B24B7/24
CPC分类号： B24B49/12 , B24B7/241 , B24B13/0018 , G01N21/8851 , G01N21/958 , G01N2021/8861 , G01N2021/8967 , G01N2201/06113
摘要： A method for producing a mirror substrate blank made from titanium-doped silica glass for EUV lithography, having a thickness of at least 40 millimeters, includes steps of face grinding the surface of the blank and identifying data on defects in a surface layer of the blank. Light penetrates the blank at a predetermined angle of incidence α of less than 90° at a location on the flat surface of the blank. The light scatters on a defect in the blank, and the scattered light is detected at a distance x from the penetration location on the surface of the blank by a light detection element arranged perpendicularly thereabove. The method further includes steps of determining the position of the defect in the surface layer based on the obtained data, and partial or complete removal of the surface layer in consideration of the position determination and forming the mirror substrate blank.
摘要翻译： 用于EUV光刻的由钛掺杂的石英玻璃制成的具有至少40毫米厚度的反射镜基板坯料的方法包括以下步骤：对所述坯件的表面进行表面研磨并识别所述坯料的表面层中的缺陷的数据 。 光在坯料的平坦表面上的位置以预定的入射角α小于90°穿透坯料。 光散射在坯料的缺陷上，并且通过垂直于其上布置的光检测元件在与坯料表面上的穿透位置相距x的距离处检测散射光。 该方法还包括基于所获得的数据确定表面层中的缺陷的位置的步骤，以及考虑到位置确定并形成镜面基板坯料来部分地或完全地去除表面层。
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6.发明申请METHOD FOR PRODUCING A BLANK OF FLUORINE-DOPED AND TITANIUM-DOPED GLASS HAVING A HIGH SILICIC-ACID CONTENT AND A BLANK PRODUCED ACCORDING TO THE METHOD 有权用于生产具有高硅酸含量的氟化钆和钛酸盐玻璃的空白的方法和根据该方法生产的空白公开(公告)号：US20160085145A1
公开(公告)日：2016-03-24
申请号：US14862707
申请日：2015-09-23
发明人： Stefan OCHS , Klaus BECKER
CPC分类号： G03F1/22 , C03B19/06 , C03B19/14 , C03B19/1453 , C03B19/1461 , C03B32/00 , C03B2201/075 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C3/04 , C03C3/06 , C03C21/007 , C03C23/00 , C03C23/007 , C03C2201/12 , C03C2201/23 , C03C2201/42 , C03C2203/40 , C03C2203/54 , G03F1/24 , G03F1/60 , G03F7/00
摘要： A method for producing a silica glass blank co-doped with titanium and fluorine for use in EUV lithography includes (a) producing a TiO2—SiO2 soot body by flame hydrolysis of silicon- and titanium-containing precursor substances, (b) fluorinating the TiO2—SiO2 soot body to form a fluorine-doped TiO2—SiO2 soot body, (c) treating the fluorine-doped TiO2—SiO2 soot body in a water vapor-containing atmosphere to form a conditioned soot body, and (d) vitrifying the conditioned soot body to form the blank. The blank has an internal transmission of at least 60% in the wavelength range of 400 to 700 nm at a sample thickness of 10 mm, a mean OH content in the range of 10 to 100 wt. ppm and a mean fluorine content in the range of 2,500 to 10,000 wt. ppm. Titanium is present in the blank in the oxidation forms Ti3+ and Ti4+.
摘要翻译： 用于EUV光刻的共同掺杂钛和氟的二氧化硅玻璃毛坯的制造方法包括（a）通过含硅和钛的前体物质的火焰水解制备TiO 2 -SiO 2烟炱体，（b）氟化TiO 2 -SiO2烟灰体，形成氟掺杂的TiO 2 -SiO 2烟炱体，（c）在含水蒸气的气氛中处理氟掺杂的TiO 2 -SiO 2烟炱体以形成调节的烟灰体，（d） 烟灰体形成空白。 空白样品厚度为10mm时，在400〜700nm的波长范围内具有至少60％的内透射率，10〜100wt。范围内的平均OH含量。 ppm，平均氟含量在2500至10,000重量％的范围内。 ppm。 钛在氧化形式Ti3 +和Ti4 +中存在于坯料中。
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7.发明申请公开(公告)号：US20150376048A1
公开(公告)日：2015-12-31
申请号：US14748344
申请日：2015-06-24
发明人： Klaus BECKER , Stefan OCHS , Stephan THOMAS
CPC分类号： C03B23/04 , C03B19/066 , C03B19/1453 , C03B19/1469 , C03B2201/06 , C03B2201/075 , C03B2201/42 , C03C3/06 , C03C2201/42 , C03C2203/10 , C03C2203/50 , G03F1/24 , G03F7/70316 , G03F7/7095
摘要： A blank made of titanium-doped silica glass for a mirror substrate for use in EUV lithography is provided. The blank includes a surface portion to be provided with a reflective film and having an optically used area (CA) over which a coefficient of thermal expansion (CTE) has a two-dimensional inhomogeneity (dCTE) distribution profile averaged over a thickness of the blank. A maximum inhomogeneity (dCTEmax) of less than 5 ppb/K is defined as a difference between a CTE maximum value and a CTE minimum value. The dCTEmax is at least 0.5 ppb/K. The CA forms a non-circular area having a centroid. The dCTE distribution profile is not rotation-symmetrical and is defined over the CA, such that straight profile sections normalized to a unit length and extending through the centroid of the area yield a dCTE family of curves forming a curve band with a bandwidth of less than 0.5×dCTEmax.
摘要翻译： 提供了一种用于EUV光刻的用于镜面基板的掺钛石英玻璃的空白件。 坯料包括具有反射膜并具有光学用途区域（CA）的表面部分，在该区域上的热膨胀系数（CTE）在坯料的厚度上平均的二维不均匀性（dCTE）分布分布平均 。 小于5ppb / K的最大不均匀性（dCTEmax）定义为CTE最大值和CTE最小值之间的差。 dCTEmax至少为0.5 ppb / K。 CA形成具有质心的非圆形区域。 dCTE分布轮廓不是旋转对称的，并且在CA上定义，使得被归一化为单位长度并延伸穿过该区域的质心的直线剖面产生了形成带宽小于的曲线的dCTE曲线族 0.5×dCTEmax。
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