Invention Application
- Patent Title: FIN-TYPE GRAPHENE DEVICE
- Patent Title (中): FIN型石墨设备
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Application No.: US14747243Application Date: 2015-06-23
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Publication No.: US20160087042A1Publication Date: 2016-03-24
- Inventor: Minhyun LEE , Jaeho LEE , Jinseong HEO , Kiyoung LEE
- Applicant: Samsung Electronics Co., Ltd.
- Priority: KR10-2014-0127192 20140923
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L29/417 ; H01L29/45 ; H01L29/786

Abstract:
Example embodiments relate to a fin-type graphene device. The fin-type graphene device includes a substrate, a graphene channel layer substantially vertical to the substrate, a gate insulating layer that covers one side surface of the graphene channel layer, a gate electrode on the gate insulating layer, and a source electrode and a drain electrode that are formed separately from each other on other side surface of the graphene channel layer.
Public/Granted literature
- US09515144B2 Fin-type graphene device Public/Granted day:2016-12-06
Information query
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