Invention Application
US20160090435A1 BLOCK COPOLYMER, METHOD OF FORMING THE SAME, AND METHOD OF FORMING PATTERN
审中-公开
嵌段共聚物,其形成方法和形成图案的方法
- Patent Title: BLOCK COPOLYMER, METHOD OF FORMING THE SAME, AND METHOD OF FORMING PATTERN
- Patent Title (中): 嵌段共聚物,其形成方法和形成图案的方法
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Application No.: US14962183Application Date: 2015-12-08
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Publication No.: US20160090435A1Publication Date: 2016-03-31
- Inventor: Min Hyuck KANG , Su Mi LEE , Myung Im KIM , Tae Woo KIM , Seung-Won PARK , Xie LEI , Na Na KANG , Bong-Jin MOON , Joona BANG , Sang Hoon WOO , Jin Yeong LEE , Hyun Jung JUNG , June HUH
- Applicant: Samsung Display Co., Ltd. , Sogang University Research Foundation , KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
- Priority: KR10-2013-0003439 20130111
- Main IPC: C08F299/02
- IPC: C08F299/02

Abstract:
A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
Public/Granted literature
- US09725550B2 Block copolymer, method of forming the same, and method of forming pattern Public/Granted day:2017-08-08
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