Invention Application
US20160091713A1 PASSIVATED MICROELECTROMECHANICAL STRUCTURES AND METHODS 有权
经济微电子结构与方法

  • Patent Title: PASSIVATED MICROELECTROMECHANICAL STRUCTURES AND METHODS
  • Patent Title (中): 经济微电子结构与方法
  • Application No.: US14502255
    Application Date: 2014-09-30
  • Publication No.: US20160091713A1
    Publication Date: 2016-03-31
  • Inventor: Teruo Sasagawa
  • Applicant: PIXTRONIX, INC.
  • Main IPC: G02B26/02
  • IPC: G02B26/02 G09G5/10 B81C1/00
PASSIVATED MICROELECTROMECHANICAL STRUCTURES AND METHODS
Abstract:
This disclosure provides systems, methods and apparatus including devices that include a layer of passivation material covering at least a portion of an exterior surface of a thin film component within a microelectomechanical device. The thin film component may include an electrically conductive layer that connects via an anchor to a conductive surface on a substrate. The disclosure further provides processes for providing a layer of passivation material on an exterior surface of a thin film component and for electrically connecting that thin film component to a conductive surface on a substrate.
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