Invention Application
- Patent Title: PASSIVATED MICROELECTROMECHANICAL STRUCTURES AND METHODS
- Patent Title (中): 经济微电子结构与方法
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Application No.: US14502255Application Date: 2014-09-30
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Publication No.: US20160091713A1Publication Date: 2016-03-31
- Inventor: Teruo Sasagawa
- Applicant: PIXTRONIX, INC.
- Main IPC: G02B26/02
- IPC: G02B26/02 ; G09G5/10 ; B81C1/00

Abstract:
This disclosure provides systems, methods and apparatus including devices that include a layer of passivation material covering at least a portion of an exterior surface of a thin film component within a microelectomechanical device. The thin film component may include an electrically conductive layer that connects via an anchor to a conductive surface on a substrate. The disclosure further provides processes for providing a layer of passivation material on an exterior surface of a thin film component and for electrically connecting that thin film component to a conductive surface on a substrate.
Public/Granted literature
- US09395533B2 Passivated microelectromechanical structures and methods Public/Granted day:2016-07-19
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