Invention Application
US20160091796A1 MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY THE MASKLESS EXPOSURE DEVICE AND THE MASKLESS EXPOSURE METHOD
审中-公开
无障碍曝光装置，由MASKING曝光装置制造的无障碍曝光方法和显示基板以及MASKLESS曝光方法
- Patent Title: MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY THE MASKLESS EXPOSURE DEVICE AND THE MASKLESS EXPOSURE METHOD
- Patent Title (中): 无障碍曝光装置，由MASKING曝光装置制造的无障碍曝光方法和显示基板以及MASKLESS曝光方法
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Application No.: US14738543Application Date: 2015-06-12
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Publication No.: US20160091796A1Publication Date: 2016-03-31
- Inventor: JUN-HO SIM , SANG-HYUN YUN , HI-KUK LEE , HYUN-SEOK KIM
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Priority: KR10-2014-0130501 20140929
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A maskless exposure device includes an exposure head that includes a digital micro-mirror device configured to reflect a source beam received from an exposure source to a substrate to scan an exposure beam to the substrate, and a system control part configured to control the digital micro-mirror device using a graphic data system file. The graphic data system file includes data of an align-key. The align-key includes an X-align-key that extends in a direction parallel to a scan direction of the exposure head, and has a bar shape in a plan view, and a Y-align-key disposed adjacent to the X-align-key that has a frame shape in a plan view.
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Information query
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