Invention Application
- Patent Title: CENTRAL CONTROL APPARATUS FOR CONTROLLING FACILITIES, FACILITY CONTROL SYSTEM INCLUDING THE SAME, AND METHOD OF CONTROLLING FACILITIES
- Patent Title (中): 用于控制设备的中央控制装置,包括其的设施控制系统和控制设备的方法
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Application No.: US14858559Application Date: 2015-09-18
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Publication No.: US20160103475A1Publication Date: 2016-04-14
- Inventor: Junu LEE , Kiseon LEE
- Applicant: LG ELECTRONICS INC.
- Assignee: LG ELECTRONICS INC.
- Current Assignee: LG ELECTRONICS INC.
- Priority: KR10-2014-0136892 20141010
- Main IPC: G06F1/32
- IPC: G06F1/32 ; G05B19/418

Abstract:
A central control apparatus for controlling facilities, a facility control system including the same, and a method of controlling facilities may be provided. The central control apparatus may include a control unit performing control on facilities or equipment. The control unit may include a data collection module configured to collect prediction environment data including weather information of a control target region, a system setting module configured to set information of at least one facility in the control target region, and an energy use amount simulation module configured to model the at least one facility, based on the information of the at least one facility, set at least one control scenario applicable to the at least one facility, and simulate consumption power of the modeled at least one facility that operates according to the at least one control scenario.
Public/Granted literature
Information query