Invention Application
US20160116840A1 COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
有权
化合物，活性敏感性或辐射敏感性树脂组合物，使用其的耐光膜，耐光涂布掩模，光刻胶，图案形成方法，制造电子器件的方法和电子器件
- Patent Title: COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
- Patent Title (中): 化合物，活性敏感性或辐射敏感性树脂组合物，使用其的耐光膜，耐光涂布掩模，光刻胶，图案形成方法，制造电子器件的方法和电子器件
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Application No.: US14982759Application Date: 2015-12-29
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Publication No.: US20160116840A1Publication Date: 2016-04-28
- Inventor: Tomotaka TSUCHIMURA
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2013-145015 20130710; JP2014-026904 20140214
- Main IPC: G03F7/004
- IPC: G03F7/004 ; H01L21/027 ; C07C327/24 ; C07C321/28 ; C07D333/76 ; C07C309/19 ; C07C323/20 ; C07C25/18 ; C07C323/09 ; C07D333/46 ; C07D209/48 ; C07C311/16 ; C07D327/08 ; C07J41/00 ; G03F7/038 ; G03F1/76 ; H01L29/16
Abstract:
Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): in the formulae, each of Y1 and Y2 represents a monovalent organic group; each of M1+ and M2+ represents an organic onium ion; each of X1 and X2 represents a group that is represented by —S—, —NH—, or —NR1—; R1 represents a monovalent organic group; each of n1 and n2 represents an integer of 1 or more; and R1 and Y1 or Y2 may bond with each other to form a ring.
Public/Granted literature
Information query
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