Invention Application
US20160125589A1 SYSTEM AND METHOD TO DETECT SUBSTRATE AND/OR SUBSTRATE SUPPORT MISALIGNMENT USING IMAGING
有权
使用成像检测基板和/或底层支持误差的系统和方法
- Patent Title: SYSTEM AND METHOD TO DETECT SUBSTRATE AND/OR SUBSTRATE SUPPORT MISALIGNMENT USING IMAGING
- Patent Title (中): 使用成像检测基板和/或底层支持误差的系统和方法
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Application No.: US14882122Application Date: 2015-10-13
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Publication No.: US20160125589A1Publication Date: 2016-05-05
- Inventor: Leonid M. TERTITSKI , Schubert S. CHU , Shay ASSAF , Kim R. VELLORE , Zhepeng CONG
- Applicant: Applied Materials, Inc.
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G06T3/60 ; H04N5/3745 ; G06T7/40

Abstract:
A method and apparatus for detecting substrate misalignment (i.e., position displacement error) and/or substrate support misalignment. According to certain aspects, a method for detecting a misalignment of an object in a processing system is provided. The method generally includes obtaining a first image of the object, determining first values associated with pixels in at least one region of the first image, calculating at least one of a center of gravity value of the pixels in the at least one region or an average weight of the pixels in the at least one region, and detecting a misalignment of the object based on at least one of the calculated center of gravity or average weight of the pixels in the at least one region.
Public/Granted literature
- US09959610B2 System and method to detect substrate and/or substrate support misalignment using imaging Public/Granted day:2018-05-01
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