Invention Application
US20160126089A1 FLOWABLE FILM CURING PENETRATION DEPTH IMPROVEMENT AND STRESS TUNING
有权
流动性薄膜固化渗透深度改善和应力调节
- Patent Title: FLOWABLE FILM CURING PENETRATION DEPTH IMPROVEMENT AND STRESS TUNING
- Patent Title (中): 流动性薄膜固化渗透深度改善和应力调节
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Application No.: US14577943Application Date: 2014-12-19
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Publication No.: US20160126089A1Publication Date: 2016-05-05
- Inventor: Jingmei LIANG , Jung Chan LEE , Yong SUN
- Applicant: APPLIED MATERIALS, INC.
- Main IPC: H01L21/02
- IPC: H01L21/02
Abstract:
Methods for depositing and curing a flowable dielectric layer are disclosed herein. Methods can include forming a flowable dielectric layer, immersing the flowable dielectric layer in an oxygen-containing gas, purging the chamber and curing the layer with UV radiation. By curing the layer after an oxygen-containing gas pre-soak, the layer can be more completely cured during the UV irradiation.
Public/Granted literature
- US09570287B2 Flowable film curing penetration depth improvement and stress tuning Public/Granted day:2017-02-14
Information query
IPC分类:
