Invention Application
- Patent Title: SEMICONDUCTOR PACKAGE AND FABRICATION METHOD THEREOF
- Patent Title (中): 半导体封装及其制造方法
-
Application No.: US14919867Application Date: 2015-10-22
-
Publication No.: US20160133556A1Publication Date: 2016-05-12
- Inventor: Ching-Wen Chiang , Cheng-Hao Ciou , Cheng-Chieh Wu , Kuang-Hsin Chen , Hsien-Wen Chen
- Applicant: Siliconware Precision Industries Co., Ltd.
- Priority: TW103139187 20141112
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L23/31 ; H01L21/48 ; H01L23/29

Abstract:
A semiconductor package is provided, including: an insulating base body having a first surface with an opening and a second surface opposite to the first surface; an insulating extending body extending outward from an edge of the first surface of the insulating base body, wherein the insulating extending body is less in thickness than the insulating base body; an electronic element having opposite active and inactive surfaces and disposed in the opening with its inactive surface facing the insulating base body; a dielectric layer formed in the opening of the insulating base body and on the first surface of the insulating base body, the insulating extending body and the active surface of the electronic element; and a circuit layer formed on the dielectric layer and electrically connected to the electronic element. The configuration of the insulating layer of the invention facilitates to enhance the overall structural rigidity of the package.
Public/Granted literature
- US09627307B2 Semiconductor package and fabrication method thereof Public/Granted day:2017-04-18
Information query
IPC分类: