Invention Application
- Patent Title: Radiation Source for an EUV Optical Lithographic Apparatus, and Lithographic Apparatus Comprising such a Radiation Source
- Patent Title (中): 用于EUV光刻设备的辐射源和包括这种辐射源的平版印刷设备
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Application No.: US14899196Application Date: 2014-06-05
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Publication No.: US20160147160A1Publication Date: 2016-05-26
- Inventor: Johannes Christiaan Leonardus FRANKEN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2014/061710 WO 20140605
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A radiation source generates extreme ultraviolet radiation. The radiation source comprises a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma. A receiving structure is provided to trap debris particles on its surface that are generated with the formation of the plasma. The receiving structure has a rod-shaped heater element for heating the receiving surface, the device preventing large droplets of fuel from forming on the receiving surface. Instead, the trapped fuel is melted off the receiving surface.
Public/Granted literature
Information query
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