公开(公告)号：US20160147160A1

公开(公告)日：2016-05-26

申请号：US14899196

申请日：2014-06-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Christiaan Leonardus FRANKEN

IPC: G03F7/20

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/005

Abstract: A radiation source generates extreme ultraviolet radiation. The radiation source comprises a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma. A receiving structure is provided to trap debris particles on its surface that are generated with the formation of the plasma. The receiving structure has a rod-shaped heater element for heating the receiving surface, the device preventing large droplets of fuel from forming on the receiving surface. Instead, the trapped fuel is melted off the receiving surface.

Abstract translation: 辐射源产生极紫外线辐射。 辐射源包括位于燃料将被辐射束接触以形成等离子体的位置处的等离子体形成位置。 提供接收结构以捕获其形成等离子体时产生的碎屑颗粒在其表面上。 接收结构具有用于加热接收表面的棒状加热器元件，该装置防止在接收表面上形成大的燃料液滴。 相反，被捕获的燃料从接收表面熔化。

公开(公告)号：US20150338753A1

公开(公告)日：2015-11-26

申请号：US14409048

申请日：2013-06-13

Applicant: ASML Netherlands B.V.

Inventor： Michel RIEPEN ,  Dzmitry LEBETSKI ,  Wilbert Jan MESTROM ,  Wim Ronald KAMPINGA ,  Jan Okke NIEUWENKAMP ,  Jacob BRINKERT ,  Henricus Jozef CASTELIJNS ,  Nicolaas TEN KATE ,  Hendrikus Gijsbertus SCHIMMEL ,  Hans JANSEN ,  Dennis Jozef Maria PAULUSSEN ,  Brian Vernon VIRGO ,  Reinier Theodorus Martinus JILISEN ,  Ramin BADIE ,  Albert Pieter RIJPMA ,  Johannes Christiaan Leonardus FRANKEN ,  Peter VAN PUTTEN ,  Gerrit VAN DER STRAATEN

IPC: G03F7/20 ,  G21K5/08 ,  F15D1/00 ,  H05G2/00

CPC classification number: G03F7/70983 ,  F15D1/0065 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/06 ,  G21K5/08 ,  H05G2/005 ,  H05G2/008 ,  Y10T137/206

Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Abstract translation: 一种辐射源，包括燃料源，其构造成将燃料输送到燃料发射EUV辐射的位置。 辐射源还包括设置有多个凹槽的不动的燃料碎屑接收表面。 凹槽具有定向，其布置成在一个或多个所需方向上在重力的影响下引导液体燃料的流动。

公开(公告)号：US20220035239A1

公开(公告)日：2022-02-03

申请号：US17278356

申请日：2019-10-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter-Jan VAN ZWOL ,  Sander BALTUSSEN ,  Dennis DE GRAAF ,  Johannes Christiaan Leonardus FRANKEN ,  Adrianus Johannes Maria GIESBERS ,  Alexander Ludwig KLEIN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Alexey Sergeevich KUZNETSOV ,  Arnoud Willem NOTENBOOM ,  Mahdiar VALEFI ,  Marcus Adrianus VAN DE KERKHOF ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Ties Wouter VAN DER WOORD ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64 ,  G03F7/20

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.