Invention Application
US20160155657A1 SURFACE PROFILE MODIFICATIONS FOR EXTENDED LIFE OF CONSUMABLE PARTS IN SEMICONDUCTOR PROCESSING EQUIPMENT
审中-公开
用于半导体加工设备中消耗性部件的延长寿命的表面形状修改
- Patent Title: SURFACE PROFILE MODIFICATIONS FOR EXTENDED LIFE OF CONSUMABLE PARTS IN SEMICONDUCTOR PROCESSING EQUIPMENT
- Patent Title (中): 用于半导体加工设备中消耗性部件的延长寿命的表面形状修改
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Application No.: US14955771Application Date: 2015-12-01
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Publication No.: US20160155657A1Publication Date: 2016-06-02
- Inventor: Ramesh GOPALAN , Simon YAVELBERG
- Applicant: Applied Materials, Inc.
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01L21/67
Abstract:
Examples of the disclosure generally relate to a component for use in a semiconductor process chamber includes a body having machined surfaces including a processing facing surface configured to face a processing region of the semiconductor process chamber, and a profile disposed on the plasma facing surface wherein the profile increases the surface area of the processing facing surface without increasing a base surface area.
Information query
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