Invention Application
US20160161857A1 PELLICLE WITH AEROGEL SUPPORT FRAME 有权
带气球支撑框架的油门

PELLICLE WITH AEROGEL SUPPORT FRAME
Abstract:
Disclosed herein are various pellicles for use during extreme ultraviolet (EUV) photolithography processes. An EUV radiation device disclosed herein includes a reticle, a substrate support stage, a pellicle positioned between the reticle and the substrate support stage, wherein the pellicle includes an aerogel grid and a membrane formed on the aerogel grid, and a radiation source that is adapted to generate radiation at a wavelength of about 20 nm or less that is to be directed through the pellicle toward the reticle.
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