Invention Application
- Patent Title: INTERPOSER WITH EXTRUDED FEED-THROUGH VIAS
- Patent Title (中): 具有挤压式进料口的间隙器
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Application No.: US15000884Application Date: 2016-01-19
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Publication No.: US20160163630A1Publication Date: 2016-06-09
- Inventor: STEVEN KUMMERL
- Applicant: Texas Instruments Incorporated
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L23/00

Abstract:
A semiconductor device comprises an interposer with extruded feed-through vias and a semiconductor die. The interposers includes a substrate having a plurality of through-vias. A dielectric liner lining said through-vias. A plurality of feed-thru electrically conducting features provided by a plurality of extruded metal wires within said dielectric liner. A semiconductor die attached to said interposer.
Public/Granted literature
- US10535594B2 Interposer with extruded feed-through vias Public/Granted day:2020-01-14
Information query
IPC分类: