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Invention Application
US20160167988A1 PROCESS FOR REDUCING THE LEVEL OF CHLORIDE IN CHLOROSILANE DIRECT PROCESS HYDROLYZED SUBSTRATE USING MECHANOCHEMICAL TREATMENT 审中-公开
使用机械处理降低氯仿直接过程水解底物氯化物含量的方法

  • Patent Title: PROCESS FOR REDUCING THE LEVEL OF CHLORIDE IN CHLOROSILANE DIRECT PROCESS HYDROLYZED SUBSTRATE USING MECHANOCHEMICAL TREATMENT
  • Patent Title (中): 使用机械处理降低氯仿直接过程水解底物氯化物含量的方法
  • Application No.: US14565989
    Application Date: 2014-12-10
  • Publication No.: US20160167988A1
    Publication Date: 2016-06-16
  • Inventor: David S Schlitzer , Susan A Nye , Mark Lunden
  • Applicant: Momentive Performance Materials Inc.
  • Main IPC: C02F1/58
  • IPC: C02F1/58
PROCESS FOR REDUCING THE LEVEL OF CHLORIDE IN CHLOROSILANE DIRECT PROCESS HYDROLYZED SUBSTRATE USING MECHANOCHEMICAL TREATMENT
Abstract:
The present invention relates to a process for providing a low-chloride hydrolyzate comprising subjecting an acid or base hydrolyzed substrate of a chlorosilane direct process residue to a mechanochemical means to provide a hydrolyzate with a chloride content of less than about 1.1% by weight. The process of present invention is especially useful in cement kilns and smelter operation.
Abstract(Chinese):

本发明涉及一种提供低氯化物水解产物的方法，包括将氯硅烷直接处理残余物的酸或碱水解底物经受机械化学方法，以提供氯化物含量小于约1.1重量％的水解产物。 本发明的方法在水泥窑和冶炼厂操作中特别有用。

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