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1.发明申请PROCESS FOR REDUCING THE LEVEL OF CHLORIDE IN CHLOROSILANE DIRECT PROCESS HYDROLYZED SUBSTRATE USING MECHANOCHEMICAL TREATMENT 审中-公开使用机械处理降低氯仿直接过程水解底物氯化物含量的方法公开(公告)号：US20160167988A1
公开(公告)日：2016-06-16
申请号：US14565989
申请日：2014-12-10
Applicant: Momentive Performance Materials Inc.
Inventor： David S Schlitzer , Susan A Nye , Mark Lunden
IPC: C02F1/58
CPC classification number: C02F1/58 , C01B33/107 , C02F2101/12
Abstract: The present invention relates to a process for providing a low-chloride hydrolyzate comprising subjecting an acid or base hydrolyzed substrate of a chlorosilane direct process residue to a mechanochemical means to provide a hydrolyzate with a chloride content of less than about 1.1% by weight. The process of present invention is especially useful in cement kilns and smelter operation.
Abstract translation: 本发明涉及一种提供低氯化物水解产物的方法，包括将氯硅烷直接处理残余物的酸或碱水解底物经受机械化学方法，以提供氯化物含量小于约1.1重量％的水解产物。 本发明的方法在水泥窑和冶炼厂操作中特别有用。
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2.发明授权Process for reducing the level of choride in chlorosilane direct process hydrolyzed substrate 有权降低氯硅烷直接工艺水解底物中氯化钙含量的方法公开(公告)号：US09108991B1
公开(公告)日：2015-08-18
申请号：US14456384
申请日：2014-08-11
Applicant: Momentive Performance Materials Inc.
Inventor： Susan A Nye , David S Schlitzer
CPC classification number: C07F7/0832 , C04B7/24 , C07F7/0838 , C07F7/089 , C07F7/12 , C07F7/121 , C07F7/20 , Y02P40/145
Abstract: The present invention relates to a process for providing a low-chloride hydrolyzate comprising contacting an acid or base hydrolyzed substrate of a chlorosilane direct process residue with nitric acid to provide a hydrolyzate with a chloride content of less than about 1.8% by weight. The process of present invention is especially useful in cement kilns and smelter operation.
Abstract translation: 本发明涉及一种提供低氯化物水解产物的方法，包括使氯硅烷直接处理残余物的酸或碱水解底物与硝酸接触以提供氯化物含量小于约1.8重量％的水解产物。 本发明的方法在水泥窑和冶炼厂操作中特别有用。
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