Invention Application
- Patent Title: PROCESS FOR REDUCING THE LEVEL OF CHLORIDE IN CHLOROSILANE DIRECT PROCESS HYDROLYZED SUBSTRATE USING MECHANOCHEMICAL TREATMENT
- Patent Title (中): 使用机械处理降低氯仿直接过程水解底物氯化物含量的方法
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Application No.: US14565989Application Date: 2014-12-10
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Publication No.: US20160167988A1Publication Date: 2016-06-16
- Inventor: David S Schlitzer , Susan A Nye , Mark Lunden
- Applicant: Momentive Performance Materials Inc.
- Main IPC: C02F1/58
- IPC: C02F1/58

Abstract:
The present invention relates to a process for providing a low-chloride hydrolyzate comprising subjecting an acid or base hydrolyzed substrate of a chlorosilane direct process residue to a mechanochemical means to provide a hydrolyzate with a chloride content of less than about 1.1% by weight. The process of present invention is especially useful in cement kilns and smelter operation.
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