发明申请
- 专利标题： SEMICONDUCTOR DEVICES INCLUDING SPACERS
- 专利标题（中）： 半导体器件包括间隔器
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申请号： US15071452申请日： 2016-03-16
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公开(公告)号： US20160197042A1公开(公告)日： 2016-07-07
- 发明人: EUN-OK LEE , Nam-Gun Kim , Gyuhwan Oh , Heesook Park , Hyun-Jung Lee , Kyungho Jang
- 申请人： EUN-OK LEE , Nam-Gun Kim , Gyuhwan Oh , Heesook Park , Hyun-Jung Lee , Kyungho Jang
- 优先权： KR10-2013-0104386 20130830
- 主分类号： H01L23/532
- IPC分类号： H01L23/532
摘要：
A spacer covering a sidewall of a contact plug includes a relatively more damaged first portion and a relatively less damaged second portion. An interface of the first and second portions of the spacer is spaced apart from a metal silicide layer of the contact plug. Thus reliability of the semiconductor device may be improved. Related fabrication methods are also described.
公开/授权文献
- US09496223B2 Semiconductor devices including spacers 公开/授权日：2016-11-15
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