Invention Application
US20160202615A1 MASKLESS EXPOSURE DEVICE AND MASKLESS EXPOSURE METHOD USING THE SAME
有权
无障碍曝光装置和使用其的无障碍曝光方法
- Patent Title: MASKLESS EXPOSURE DEVICE AND MASKLESS EXPOSURE METHOD USING THE SAME
- Patent Title (中): 无障碍曝光装置和使用其的无障碍曝光方法
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Application No.: US14836422Application Date: 2015-08-26
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Publication No.: US20160202615A1Publication Date: 2016-07-14
- Inventor: KAB-JONG SEO , Hi-Kuk Lee , Jae-Hyuk Chang , Ki-Beom Lee
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Priority: KR10-2015-0005915 20150113
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A maskless exposure device includes a plurality of exposure heads, each exposure head including a digital micro-mirror device configured to scan an exposure beam to a substrate, the exposure heads being disposed in staggered first and second rows, a plurality of reflecting members disposed on side surfaces of the exposure heads and having reflecting surfaces parallel with each other, a light emitting part configured to light to the reflecting members, and a light receiving part configured to receive light via the reflecting members.
Public/Granted literature
- US09535333B2 Maskless exposure device and maskless exposure method using the same Public/Granted day:2017-01-03
Information query
IPC分类: