公开(公告)号：US09091871B2

公开(公告)日：2015-07-28

申请号：US13706790

申请日：2012-12-06

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jae-Hyuk Chang ,  Han-Sun Ryou ,  Yu-Deok Seo ,  Min-Uk Kim ,  Hyun-Seok Kim ,  Ki-Beom Lee ,  Sung-Hee Lee ,  Seung-Jun Lee ,  Nam-Ok Jung ,  Gug-Rae Jo

IPC: G02F1/1335 ,  G02F1/13 ,  H04N13/04 ,  G02B27/22 ,  G02F1/1333 ,  G02F1/1347 ,  G02B27/26

CPC classification number: G02F1/1313 ,  G02B27/2214 ,  G02B27/26 ,  G02F1/133305 ,  G02F1/1347 ,  H04N13/305

Abstract: In a polarizing liquid crystal panel and a display apparatus including the polarizing liquid crystal panel, the polarizing liquid crystal panel includes a first substrate, a second substrate and a liquid crystal layer. The first substrate includes a plastic substrate, a first electrode on the plastic substrate, and a first alignment layer on the first electrode. The second substrate includes a base substrate which opposes the first substrate, a second electrode on the base substrate, and a second alignment layer on the second electrode. The liquid crystal layer is between the first and second substrates and polarizes a light using an electric field between the first and second electrodes.

Abstract translation: 在偏振液晶面板和包括偏振液晶面板的显示装置中，偏振液晶面板包括第一基板，第二基板和液晶层。 第一基板包括塑料基板，塑料基板上的第一电极和第一电极上的第一对准层。 第二基板包括与第一基板相对的基底基板，基底基板上的第二电极和第二电极上的第二取向层。 液晶层位于第一和第二基板之间，并且使用第一和第二电极之间的电场使光偏振。

公开(公告)号：US09746780B2

公开(公告)日：2017-08-29

申请号：US14745366

申请日：2015-06-19

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hyun-Seok Kim ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Sang-Hyun Lee ,  Jung-In Park ,  Jung-Chul Heo ,  Kab-Jong Seo ,  Ki-Beom Lee ,  Jun-Ho Sim

IPC: G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70358 ,  G03F7/70508

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.

公开(公告)号：US09690204B2

公开(公告)日：2017-06-27

申请号：US14664770

申请日：2015-03-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Sang-Hyun Lee ,  Hyun-Seok Kim ,  Jung-Chul Heo ,  Hi-Kuk Lee ,  Sang-Hyun Yun ,  Ki-Beom Lee ,  Chang-Hoon Kim ,  Jung-In Park ,  Kab-Jong Seo ,  Jun-Ho Sim ,  Jae-Hyuk Chang

IPC: G03B27/44 ,  G03B27/68 ,  G03F7/20 ,  H01L29/786 ,  H01L27/12 ,  H01L29/417

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  H01L27/124 ,  H01L27/1285 ,  H01L29/41733 ,  H01L29/78696

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.

公开(公告)号：US09436098B2

公开(公告)日：2016-09-06

申请号：US14635339

申请日：2015-03-02

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jung-Chul Heo ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Sang-Hyun Lee ,  Jung-In Park ,  Sang-Hyun Yun ,  Ki-Beom Lee ,  Hyun-Seok Kim ,  Kab-Jong Seo ,  Jun-Ho Sim ,  Byoung-Min Yun ,  Sang-Don Jang ,  Jae-Young Jang ,  Chang-Hoon Kim

IPC: G03F7/20 ,  H01L29/786 ,  H01L27/12

CPC classification number: G03F7/70508 ,  G03F7/2022 ,  G03F7/2051 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70391 ,  H01L27/1222 ,  H01L27/124 ,  H01L27/1259 ,  H01L29/78669 ,  H01L29/78693 ,  H01L29/78696

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.

Abstract translation: 无掩模曝光装置包括具有数字微镜装置的曝光头。 数字微镜装置被配置为将从曝光源施加的源光束传输到衬底。 系统控制部分被配置为通过使用图形数据系统文件来控制数字微镜装置。 图形数据系统文件包括用于形成源电极，漏电极和设置在源电极和漏电极之间的沟道部分的数据。 图形系统文件包括用于形成相对于曝光头的扫描方向沿对角线方向延伸的通道部分的数据。

公开(公告)号：US20160116847A1

公开(公告)日：2016-04-28

申请号：US14745366

申请日：2015-06-19

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hyun-Seok Kim ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Sang-Hyun Lee ,  Jung-In Park ,  Jung-Chul Heo ,  Kab-Jong Seo ,  Ki-Beom Lee ,  Jun-Ho Sim

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70358 ,  G03F7/70508

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.

Abstract translation: 无掩模曝光装置包括具有数字微镜装置和曝光源的曝光头，数字微镜装置被配置为将从曝光源输出的源光束反射到基板，以及系统控制器，被配置为控制数字 微镜设备通过使用图形数据系统文件。 图形数据系统文件包括关于要在基板上形成的图案的数据。 在与曝光头的扫描方向平行的方向上延伸的图案包括具有大于目标宽度的第一宽度的第一图案部分和与第一图案部分交替设置的第二图案部分，并且具有第二宽度， 小于目标宽度。

公开(公告)号：US09023558B2

公开(公告)日：2015-05-05

申请号：US13655597

申请日：2012-10-19

Applicant: Samsung Display Co., Ltd.

Inventor： Ki-Beom Lee ,  Su-Yeon Sim ,  Jae-Hyuk Chang ,  Chang-Hoon Kim ,  Hi-Kuk Lee

IPC: G03F7/031 ,  G03F7/20 ,  G03F7/00 ,  G03F7/029 ,  G03F7/033 ,  G03F7/105

CPC classification number: G03F7/2051 ,  G03F7/0007 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/105

Abstract: Exemplary embodiments of the present invention relate to a photoresist composition and method of forming a color filter using the same. A photoresist composition according to an exemplary embodiment includes about 5% by weight to about 10% by weight of a binder resin, about 5% by weight to about 10% by weight of a monomer, about 1% by weight to about 15% by weight of a photo initiator configured to be activated a light having a peak wavelength from about 400 nm to about 410 nm, about 1% by weight to about 10% by weight of a pigment, about 0.01% by weight to about 1% by weight of a pigment dispersing agent, and a solvent.

Abstract translation: 本发明的示例性实施方案涉及光致抗蚀剂组合物和使用其形成滤色器的方法。 根据示例性实施方案的光致抗蚀剂组合物包含约5重量％至约10重量％的粘合剂树脂，约5重量％至约10重量％的单体，约1重量％至约15重量％ 光引发剂的重量被配置为激活具有约400nm至约410nm的峰值波长的光，约1重量％至约10重量％的颜料，约0.01重量％至约1重量％ 的颜料分散剂和溶剂。

公开(公告)号：US09335631B2

公开(公告)日：2016-05-10

申请号：US14446282

申请日：2014-07-29

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Ki-Beom Lee ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Chang-Hoon Kim ,  Jung-In Park

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/40 ,  C08F220/30

CPC classification number: G03F7/0388 ,  C08F220/30 ,  C08F2220/301 ,  C08F2220/303 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/40

Abstract: A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.

Abstract translation: 光敏树脂组合物包括约5重量％至约25重量％的酸不稳定树脂，约5重量％至约10重量％的单体，约5重量％至约10重量％的光酸产生剂，光反应 约1重量％至约5重量％的促进剂和约50重量％至约84重量％的溶剂，其中酸不稳定树脂包含含有酸基的重复单元和被保护重复的保护基 单元。

公开(公告)号：US20150168833A1

公开(公告)日：2015-06-18

申请号：US14446282

申请日：2014-07-29

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Ki-Beom Lee ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Chang-Hoon Kim ,  Jung-In Park

IPC: G03F7/038 ,  G03F7/40

CPC classification number: G03F7/0388 ,  C08F220/30 ,  C08F2220/301 ,  C08F2220/303 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/40

Abstract: A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.

Abstract translation: 光敏树脂组合物包括约5重量％至约25重量％的酸不稳定树脂，约5重量％至约10重量％的单体，约5重量％至约10重量％的光酸产生剂，光反应 约1重量％至约5重量％的促进剂和约50重量％至约84重量％的溶剂，其中酸不稳定树脂包含含有酸基的重复单元和被保护重复的保护基 单元。

公开(公告)号：US08889032B2

公开(公告)日：2014-11-18

申请号：US13728463

申请日：2012-12-27

Applicant: Samsung Display Co., Ltd.

Inventor： Jong-Hyun Choung ,  In-Bae Kim ,  Seon-II Kim ,  Hong Sick Park ,  Jae Woo Jeong ,  Gyu-Po Kim ,  Won-Guk Seo ,  Hyun-Cheol Shin ,  Ki-Beom Lee ,  Sam-Young Cho ,  Seung-Yeon Han

IPC: C09K13/04 ,  H01L21/48 ,  C23F1/26 ,  C23F1/18

CPC classification number: C23F1/18 ,  C23F1/26 ,  H01L21/4814

Abstract: A metal wire etchant including persulfate, a sulfonate, a fluorine compound, an azole-based compound, an organic acid, a nitrate, and a chlorine compound, and a method of making the same.

Abstract translation: 包括过硫酸盐，磺酸盐，氟化合物，唑类化合物，有机酸，硝酸盐和氯化合物的金属线蚀刻剂及其制备方法。

公开(公告)号：US09594307B2

公开(公告)日：2017-03-14

申请号：US14226621

申请日：2014-03-26

Applicant: Samsung Display Co., Ltd.

Inventor： Cha-Dong Kim ,  Hoon Kang ,  Chang-Hoon Kim ,  Sang-Hyun Yun ,  Jung-In Park ,  Woo-Yong Sung ,  Ki-Beom Lee ,  Hi-Kuk Lee ,  Jae-Hyuk Chang

IPC: G03B27/68 ,  G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/7055

Abstract: An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.

Abstract translation: 曝光装置包括光源，照明构件，突出构件，台，检查构件和信息处理构件。 光源被配置为根据表示光辐射周期的脉冲事件生成（PEG）提供光。 照明构件被配置为将光改变为点光。 突出构件被配置为根据在各个方向上延伸的光致抗蚀剂形状来投射点光源。 点灯投射在舞台上。 检查构件被配置为检查由投影点光形成的光致抗蚀剂图案。 信息处理构件被配置为分析对应于不同PEG的不同光刻胶图案，以从不同的PEG中选择一个PEG。 一个PEG与各个方向上的最小误差相关联。