Invention Application
US20160204567A1 ALIGNMENT SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
审中-公开
对准系统和极端超紫外光发生系统
- Patent Title: ALIGNMENT SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
- Patent Title (中): 对准系统和极端超紫外光发生系统
-
Application No.: US15076977Application Date: 2016-03-22
-
Publication No.: US20160204567A1Publication Date: 2016-07-14
- Inventor: Masato MORIYA , Osamu WAKABAYASHI
- Applicant: GIGAPHOTON INC.
- Applicant Address: JP Oyama-shi
- Assignee: GIGAPHOTON INC.
- Current Assignee: GIGAPHOTON INC.
- Current Assignee Address: JP Oyama-shi
- Priority: JP2011-224213 20111011
- Main IPC: H01S3/101
- IPC: H01S3/101 ; H05G2/00 ; H01S3/00

Abstract:
An alignment system for a laser apparatus includes a guide laser device outputting a guide laser beam, an adjusting mechanism adjusting travel directions of the guide laser beam and a laser beam from the laser apparatus, a beam path combiner controlling travel directions of the laser beam and the guide laser beam to substantially coincide with each other, a first optical detection unit provided from the beam path combiner detecting the laser and guide laser beams, a first controller controlling the adjusting mechanism based on a first optical detection unit detection result, a beam steering unit downstream from the beam path combiner controlling travel directions of the laser and guide laser beams, a second optical detection unit downstream from the beam steering unit detecting the guide laser beam, and a second controller controlling the beam steering unit based on a second optical detection unit detection result.
Public/Granted literature
- US10027084B2 Alignment system and extreme ultraviolet light generation system Public/Granted day:2018-07-17
Information query