Invention Application
- Patent Title: PURIFICATION PROCESS FOR GRAPHENE NANORIBBONS
- Patent Title (中): 石墨纳米粒的纯化工艺
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Application No.: US14914558Application Date: 2014-08-25
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Publication No.: US20160207776A1Publication Date: 2016-07-21
- Inventor: Tobias Hintermann , Matthias Georg Schwab , Kitty Chih-Pei Cha , Thomas Weitz , Ansgar Schäfer , Imke Britta Müller
- Applicant: BASF SE
- Priority: EP13182933.5 20130904; EP14168687.3 20140516
- International Application: PCT/EP2014/068007 WO 20140825
- Main IPC: C01B31/04
- IPC: C01B31/04 ; H01L29/16 ; H01L29/78 ; H01L29/06

Abstract:
In a process for purifying graphene nanoribbons, a composition comprising graphene nanoribbons GNR1 and at least one contaminant is brought into contact with a liquid medium that includes a dispersant. The graphene nanoribbons GNR1 are dispersed in the liquid medium so as to obtain a liquid dispersion of the graphene nanoribbons GNR1. The liquid dispersion of the graphene nanoribbons GNR1 is subjected to a separation treatment so as to at least partly remove the at least one contaminant, thereby obtaining a liquid dispersion of purified graphene nanoribbons GNR1.
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