发明申请
- 专利标题: APPARATUS AND METHOD FOR FORMING FILM
- 专利标题(中): 装置和形成薄膜的方法
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申请号: US14632768申请日: 2015-02-26
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公开(公告)号: US20160222511A1公开(公告)日: 2016-08-04
- 发明人: Takahiro Sasaki , Masaya Oda , Toshimi Hitora
- 申请人: FLOSFIA INC.
- 申请人地址: JP Kyoto-shi
- 专利权人: FLOSFIA INC.
- 当前专利权人: FLOSFIA INC.
- 当前专利权人地址: JP Kyoto-shi
- 优先权: JP2015-015217 20150129; JP2015-023488 20150209
- 主分类号: C23C16/455
- IPC分类号: C23C16/455 ; C23C16/448 ; C23C16/458 ; C23C16/44
摘要:
Provided is a film forming apparatus which is excellent in the film formation rate and is useful for performing mist CVD. A film forming apparatus includes an atomization/droplet-formation unit for turning a raw-material solution into a mist or droplets a raw-material solution, a carrying unit for carrying the mist or droplets generated in the atomization/droplet-formation unit onto a base using a carrier gas, and a film forming unit for treating the mist or droplets with heat to form a film on the base. The film forming unit is cylindrical or almost cylindrical and has an inlet for introducing the mist or droplets in a side surface thereof so that the mist or droplets is swirled to generate a swirling flow. And the film forming unit has an exhaust outlet in a top surface thereof.
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