公开(公告)号：US11088242B2

公开(公告)日：2021-08-10

申请号：US16981550

申请日：2020-03-30

申请人： FLOSFIA INC.

发明人： Tokiyoshi Matsuda ,  Takahiro Sasaki ,  Toshimi Hitora ,  Isao Takahashi

IPC分类号： C30B29/22 ,  H01L29/04 ,  H01L29/24 ,  H01L21/02 ,  H01C7/04 ,  H01L29/872 ,  H01L29/78 ,  H01C7/02

摘要： As an aspect of an embodiment, a crystal contains a metal oxide containing Ga and Mn and having a corundum structure.

公开(公告)号：US10989609B2

公开(公告)日：2021-04-27

申请号：US16611291

申请日：2018-04-27

申请人： FLOSFIA INC.

发明人： Shingo Yagyu ,  Takahiro Sasaki ,  Toshimi Hitora

IPC分类号： G01K7/22 ,  H01C7/04 ,  H01C17/18

摘要： Under predetermined film depositing conditions, the raw material solution of the thermistor film is atomized or dropletized, the carrier gas is supplied to the obtained mist or droplet, the mist or droplet is conveyed to the substrate, and then the mist or droplet is thermally reacted on the substrate to deposit a film. A resultant thermistor thin film has a film thickness of 1 μm or less, a film width of 5 mm or more, a thickness of 50 nm or more and 5 μm or less, a thickness in the range of less than ±50 nm, a thickness of 5 mm or less, and/or a thickness of 50 nm or more and 5 μm or less, and has a film surface roughness (Ra) of 0.1 μm or less.

公开(公告)号：US10927458B2

公开(公告)日：2021-02-23

申请号：US16151461

申请日：2018-10-04

申请人： FLOSFIA INC.

发明人： Shingo Yagyu ,  Takahiro Sasaki ,  Nobuaki Watanabe ,  Takashi Shinohe

IPC分类号： C23C16/448 ,  C23C16/34 ,  C23C16/455

摘要： In a first aspect of a present inventive subject matter, a method of forming a film includes turning a raw material containing at least a first chemical element and a second chemical element into atomized droplets; carrying the atomized droplets containing at least the first chemical element and the second chemical element by use of a carrier gas onto an object; and causing a reaction of the atomized droplets to form a film containing at least the first chemical element and the second chemical element on the object. The first chemical element is selected from among elements of Group 14 and elements of Group 15 of the periodic table. The second chemical element is selected from among d-block elements, elements of Group 13 and elements of Group 14 of the periodic table and different from the first chemical element.

公开(公告)号：US10106633B2

公开(公告)日：2018-10-23

申请号：US14975210

申请日：2015-12-18

申请人： FLOSFIA INC.

发明人： Takahiro Sasaki ,  Masaya Oda ,  Toshimi Hitora ,  Toyosuke Ibi

IPC分类号： C08F112/08 ,  C08F2/01 ,  C08F2/20 ,  B05D1/00 ,  B05B17/06

摘要： Provided is a method and an apparatus for producing a novel polymer that is easy and convenient to control the reactivity and excellent in film thickness control and a method and an apparatus for producing an organic film. A production apparatus includes: a first means for turning a raw-material solution containing an organic compound into a mist or droplets by an atomization or a droplet-formation; a second means for carrying the mist or droplets onto a substrate using a carrier gas; and a third means for subjecting the mist or droplets to a thermal reaction by heating on the substrate. Using the production apparatus, an organic film, such as a polymer film, is formed by atomizing or forming droplets from, for example, a raw-material solution containing the organic compound, such as a monomer, delivering a mist or droplets generated by the atomization or the droplet-formation to a substrate with a carrier gas, and, after the delivery, subjecting the mist or the droplets to a thermal reaction by heating on the substrate.

公开(公告)号：US20160215391A1

公开(公告)日：2016-07-28

申请号：US14975210

申请日：2015-12-18

申请人： FLOSFIA INC.

发明人： Takahiro Sasaki ,  Masaya Oda ,  Toshimi Hitora ,  Toyosuke Ibi

IPC分类号： C23C16/455 ,  C08F112/08 ,  C08F120/14

CPC分类号： C08F112/08 ,  B05B17/0615 ,  B05D1/02 ,  B05D1/60 ,  C08F2/01 ,  C08F2/20 ,  C08F220/14 ,  C08F212/08

摘要： Provided is a method and an apparatus for producing a novel polymer that is easy and convenient to control the reactivity and excellent in film thickness control and a method and an apparatus for producing an organic film. A production apparatus includes: a first means for turning a raw-material solution containing an organic compound into a mist or droplets by an atomization or a droplet-formation; a second means for carrying the mist or droplets onto a substrate using a carrier gas; and a third means for subjecting the mist or droplets to a thermal reaction by heating on the substrate. Using the production apparatus, an organic film, such as a polymer film, is formed by atomizing or forming droplets from, for example, a raw-material solution containing the organic compound, such as a monomer, delivering a mist or droplets generated by the atomization or the droplet-formation to a substrate with a carrier gas, and, after the delivery, subjecting the mist or the droplets to a thermal reaction by heating on the substrate.

摘要翻译： 本发明提供了容易且方便地控制反应性和优异的膜厚控制的新型聚合物的制造方法和装置以及制造有机膜的方法和装置。 一种生产设备包括：通过雾化或液滴形成将含有有机化合物的原料溶液转化成雾或液滴的第一装置; 用于使用载气将雾或液滴携带到基底上的第二装置; 以及用于通过在基板上加热来对雾或液滴进行热反应的第三装置。 使用该制造装置，通过从例如单体等含有有机化合物的原料溶液中雾化或形成液滴，形成由聚合物薄膜形成的有机薄膜，从而产生雾状或液滴 用载气雾化或液滴形成到基板上，并且在输送之后，通过在基板上加热使雾或液滴经受热反应。

公开(公告)号：US20160222511A1

公开(公告)日：2016-08-04

申请号：US14632768

申请日：2015-02-26

申请人： FLOSFIA INC.

发明人： Takahiro Sasaki ,  Masaya Oda ,  Toshimi Hitora

IPC分类号： C23C16/455 ,  C23C16/448 ,  C23C16/458 ,  C23C16/44

CPC分类号： C23C16/45508 ,  B05B17/0615 ,  C23C16/4412 ,  C23C16/448 ,  C23C16/4486 ,  C23C16/45502 ,  C23C16/45506 ,  C23C16/4586

摘要： Provided is a film forming apparatus which is excellent in the film formation rate and is useful for performing mist CVD. A film forming apparatus includes an atomization/droplet-formation unit for turning a raw-material solution into a mist or droplets a raw-material solution, a carrying unit for carrying the mist or droplets generated in the atomization/droplet-formation unit onto a base using a carrier gas, and a film forming unit for treating the mist or droplets with heat to form a film on the base. The film forming unit is cylindrical or almost cylindrical and has an inlet for introducing the mist or droplets in a side surface thereof so that the mist or droplets is swirled to generate a swirling flow. And the film forming unit has an exhaust outlet in a top surface thereof.

摘要翻译： 本发明提供一种成膜速度优异且可用于雾化CVD的成膜装置。 成膜装置包括用于将原料溶液转化为雾或液滴原料溶液的雾化/液滴形成单元，用于将在雾化/液滴形成单元中产生的雾或液滴携带在载体单元上的载体单元 使用载气的基底，以及用于通过热处理雾或液滴以在基底上形成膜的成膜单元。 成膜单元是圆柱形或几乎圆柱形的，并且具有用于在其侧表面中引入雾或液滴的入口，使得雾或液滴旋转以产生旋流。 并且成膜单元在其顶表面中具有排气口。