Invention Application
- Patent Title: INTERCONNECT STRUCTURE WITH REDUNDANT ELECTRICAL CONNECTORS AND ASSOCIATED SYSTEMS AND METHODS
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Application No.: US15162209Application Date: 2016-05-23
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Publication No.: US20160268235A1Publication Date: 2016-09-15
- Inventor: Anilkumar Chandolu
- Applicant: Micron Technology, Inc.
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L25/00

Abstract:
Semiconductor die assemblies having interconnect structures with redundant electrical connectors are disclosed herein. In one embodiment, a semiconductor die assembly includes a first semiconductor die, a second semiconductor die, and an interconnect structure between the first and the second semiconductor dies. The interconnect structure includes a first conductive film coupled to the first semiconductor die and a second conductive film coupled to the second semiconductor die. The interconnect structure further includes a plurality of redundant electrical connectors extending between the first and second conductive films and electrically coupled to one another via the first conductive film.
Public/Granted literature
- US09818728B2 Interconnect structure with redundant electrical connectors and associated systems and methods Public/Granted day:2017-11-14
Information query
IPC分类: