发明申请
US20160268341A1 HIGH DENSITY SELECTOR-BASED NON VOLATILE MEMORY CELL AND FABRICATION
有权
高密度选择器的非易失性存储器单元和制造
- 专利标题: HIGH DENSITY SELECTOR-BASED NON VOLATILE MEMORY CELL AND FABRICATION
- 专利标题(中): 高密度选择器的非易失性存储器单元和制造
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申请号: US14795105申请日: 2015-07-09
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公开(公告)号: US20160268341A1公开(公告)日: 2016-09-15
- 发明人: Hagop Nazarian , Sung Hyun Jo , Harry Yue Gee
- 申请人: Crossbar, Inc.
- 主分类号: H01L27/24
- IPC分类号: H01L27/24 ; H01L29/66 ; H01L45/00 ; H01L29/423 ; H01L49/02
摘要:
A high density non-volatile memory device is provided that uses one or more volatile elements. In some embodiments, the non-volatile memory device can include a resistive two-terminal selector that can be in a low resistive state or a high resistive state depending on the voltage being applied. A deep trench MOS (“metal-oxide-semiconductor”) transistor having a floating gate with small area relative to conventional devices can be provided, in addition to a capacitor or transistor acting as a capacitor. A first terminal of the capacitor can be connected to a voltage source, and the second terminal of the capacitor can be connected to the selector device. The small area floating gate of the deep trench transistor can be connected to the other side of the selector device, and a second transistor can be connected in series with the deep trench transistor.
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