Invention Application
- Patent Title: REACTOR SYSTEM FOR HIGH THROUGHPUT APPLICATIONS
- Patent Title (中): 用于高通量应用的反应器系统
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Application No.: US15036831Application Date: 2014-11-20
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Publication No.: US20160288081A1Publication Date: 2016-10-06
- Inventor: Roelandus Hendrikus Wilhelmus Moonen , Benno Hartog
- Applicant: AVANTIUM TECHNOLOGIES B.V.
- Applicant Address: NL Amsterdam
- Assignee: Avantium Technologies B.V.
- Current Assignee: Avantium Technologies B.V.
- Current Assignee Address: NL Amsterdam
- Priority: NL2011856 20131128
- International Application: PCT/NL2014/050793 WO 20141120
- Main IPC: B01J19/00
- IPC: B01J19/00

Abstract:
A reactor system for high throughput applications includes a plurality of reactor assemblies, each reactor assembly including: a fluid source, which fluid source is adapted to provide a pressurized fluid to the flow-through reactors, a flow splitter which flow splitter includes a planar microfluidic chip, which microfluidic chip has a chip inlet channel and a plurality of chip outlet channels, which microfluidic chip further includes a plurality of flow restrictor channels, where each flow restrictor channel extends from said chip inlet channel to an associated chip outlet channel, where the chip inlet channel and the chip outlet channels each have a diameter, where the diameter of the chip inlet channel is the same or less than the length of said chip inlet channel and where the diameter of each chip outlet channel is the same or less than the length of said chip outlet channel.
Public/Granted literature
- US10099197B2 Reactor system for high throughput applications Public/Granted day:2018-10-16
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