Invention Application
US20160301095A1 HIGH SILICA CONTENT SUBSTRATE SUCH AS FOR USE IN THIN-FILM BATTERY
有权
高二氧化硅含量基板,如用于薄膜电池
- Patent Title: HIGH SILICA CONTENT SUBSTRATE SUCH AS FOR USE IN THIN-FILM BATTERY
- Patent Title (中): 高二氧化硅含量基板,如用于薄膜电池
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Application No.: US14684627Application Date: 2015-04-13
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Publication No.: US20160301095A1Publication Date: 2016-10-13
- Inventor: Daniel Warren Hawtof , Archit Lal
- Applicant: Corning Incorporated
- Main IPC: H01M10/04
- IPC: H01M10/04 ; H01M4/505 ; H01M4/38 ; H01M4/485 ; H01M4/587 ; H01M4/525 ; H01M4/58

Abstract:
A high silica content substrate, such as for a thin-film battery, is provided. The substrate has a high silica content, such as over 90% by weight silica, and is thin, for example less than 500 μm. The substrate may include a surface with a topography or profile that facilitates bonding with a coating layer, such as a coating of an electrochemical battery material. The high silica content substrate may be flexible, have high temperature resistance, high strength and/or be non-reactive. The substrate may be suitable for use in the high temperature environments used in many chemical deposition or formation processes, such as electrochemical battery material formation processes.
Public/Granted literature
- US09634349B2 High silica content substrate such as for use in thin-film battery Public/Granted day:2017-04-25
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