Invention Application
US20160331243A1 PROBE FOR PHOTOACOUSTIC MEASUREMENT AND PHOTOACOUSTIC MEASUREMENT APPARATUS INCLUDING SAME 审中-公开
用于光电测量和光电测量装置的探测器

  • Patent Title: PROBE FOR PHOTOACOUSTIC MEASUREMENT AND PHOTOACOUSTIC MEASUREMENT APPARATUS INCLUDING SAME
  • Patent Title (中): 用于光电测量和光电测量装置的探测器
  • Application No.: US15220619
    Application Date: 2016-07-27
  • Publication No.: US20160331243A1
    Publication Date: 2016-11-17
  • Inventor: Kaku IRISAWAAtsushi HASHIMOTO
  • Applicant: FUJIFILM Corporation
  • Applicant Address: JP Tokyo
  • Assignee: FUJIFILM Corporation
  • Current Assignee: FUJIFILM Corporation
  • Current Assignee Address: JP Tokyo
  • Priority: JP2014-013063 20140128
  • Main IPC: A61B5/00
  • IPC: A61B5/00
PROBE FOR PHOTOACOUSTIC MEASUREMENT AND PHOTOACOUSTIC MEASUREMENT APPARATUS INCLUDING SAME
Abstract:
Disclosed are a probe for photoacoustic measurement which can suppress generation of artifacts obstructive to signal observation in a photoacoustic measurement, and a photoacoustic measurement apparatus including the same. The probe for photoacoustic measurement includes a light emission unit which emits measurement light to a subject, and an acoustic wave detection unit which detects a photoacoustic wave generated in the subject by the emission of measurement light. An emission end surface of the light emission unit is positioned to a side where the acoustic wave detection unit is located, with respect to a contact plane of the probe, and an optical axis at the emission end surface is inclined to a side opposite to the side on which the acoustic wave detection unit is positioned with respect to a normal direction of a detection surface of the acoustic wave detection unit.
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