Invention Application
- Patent Title: METHOD FOR FORMING SEMICONDUCTOR STRUCTURE
- Patent Title (中): 形成半导体结构的方法
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Application No.: US15221617Application Date: 2016-07-28
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Publication No.: US20160336401A1Publication Date: 2016-11-17
- Inventor: Hsin-Yu Chen , Sheng-Hao Lin , Huai-Tzu Chiang , Hao-Ming Lee
- Applicant: UNITED MICROELECTRONICS CORP.
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L21/324 ; H01L29/10 ; H01L21/02 ; H01L21/306

Abstract:
The present invention provides some methods for forming at least two different nanowire structures with different diameters on one substrate. Since the diameter of the nanowire structure will influence the threshold voltage (Vt) and the drive currents of a nanowire field effect transistor, in this invention, at least two nanowire structures with different diameters can be formed on one substrate. Therefore, in the following steps, these nanowire structures can be applied in different nanowire field effect transistors with different Vt and drive currents. This way, the flexibility of the nanowire field effect transistors can be improved.
Public/Granted literature
- US09698218B2 Method for forming semiconductor structure Public/Granted day:2017-07-04
Information query
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